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Cryo-FALP study of collisional-radiative recombination of Ar+ ions at 40–200 K

Published online by Cambridge University Press:  28 October 2011

T. Kotrík ,
P. Dohnal ,
P. Rubovič ,
R. Plašil ,
Š. Roučka ,
S. Opanasiuk  and
J. Glosík
T. Kotrík*
Affiliation:
Department of Surface and Plasma Physics, Faculty of Mathematics and Physics, Charles University, V Holešovičkách 2, Praha 18000, Czech Republic
P. Dohnal
Affiliation:
Department of Surface and Plasma Physics, Faculty of Mathematics and Physics, Charles University, V Holešovičkách 2, Praha 18000, Czech Republic
P. Rubovič
Affiliation:
Department of Surface and Plasma Physics, Faculty of Mathematics and Physics, Charles University, V Holešovičkách 2, Praha 18000, Czech Republic
R. Plašil
Affiliation:
Department of Surface and Plasma Physics, Faculty of Mathematics and Physics, Charles University, V Holešovičkách 2, Praha 18000, Czech Republic
Š. Roučka
Affiliation:
Department of Surface and Plasma Physics, Faculty of Mathematics and Physics, Charles University, V Holešovičkách 2, Praha 18000, Czech Republic
S. Opanasiuk
Affiliation:
Department of Surface and Plasma Physics, Faculty of Mathematics and Physics, Charles University, V Holešovičkách 2, Praha 18000, Czech Republic
J. Glosík
Affiliation:
Department of Surface and Plasma Physics, Faculty of Mathematics and Physics, Charles University, V Holešovičkách 2, Praha 18000, Czech Republic
*
ae-mail: kotrik.tomas@gmail.com
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Abstract

New flowing afterglow apparatus, Cryo-FALP, was built to study ternary Collisional-Radiative Recombination (CRR) of Ar+ ions with electrons in He/Ar afterglow plasma at temperatures 40–200 K. The obtained ternary recombination rate coefficient at 57 K is KCRR = (3 ± 1) × 10−17 cm6 s−1. It is the first time that the KCRR was measured below 77 K. The measured temperature dependence KCRR ~ T(−4.5 ± 0.4) is in a good agreement with theoretical prediction.

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 56 , Issue 2: Topical Issue: 18th International Colloquium on Plasma Processes (CIP 2011) , November 2011 , 24011
Copyright
© EDP Sciences, 2011

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