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X-Ray Diffraction Determination of the Effect of Passivations on Stress in Patterned Lines of Tungsten

Published online by Cambridge University Press:  22 February 2011

L. Maniguet
Affiliation:
Laboratoire de Thermodynarnique et Physico-Chimie M6tallurgiques, (URA 29), ENSEEG, BP75, 38402 St Martin d'Héres -, France
M. Ignat
Affiliation:
Laboratoire de Thermodynarnique et Physico-Chimie M6tallurgiques, (URA 29), ENSEEG, BP75, 38402 St Martin d'Héres -, France
M. Dupeux
Affiliation:
Laboratoire de Thermodynarnique et Physico-Chimie M6tallurgiques, (URA 29), ENSEEG, BP75, 38402 St Martin d'Héres -, France
J.J. Bacmann
Affiliation:
CEA/CEREM/DEM/SGSA, CENG, 17 rue des Martyrs, 38054 Grenoble cedex 9 -, France
Ph. Normandon
Affiliation:
FRANCE TELECOM - CNET, BP.98, 38243 Meylan -, France
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Abstract

The determination by X-ray diffraction of the elastic strain tensors and the corresponding stress tensors in patterned lines of tungsten has been performed to investigate the effect of various passivation. For unpassivated lines, the stresses are biaxial and decrease with decreasing line width. Passivation over patterned lines results in triaxial tensile stress. The stress along the line is not changed by the passivation. The stress across the line decreases as the line width decreases. The third component of stress, perpendicular to the surface, which appears with the passivation, increases with decreasing line width. High compressive intrinsic stress in the passivation does not result in high tensile stress in the metal line.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

[1] Maniguet, L., Ignat, M., Dupeux, M., Flinn, P. A., Normandon, Ph., Gergaud, P., Bacmann, J.J., in Advanced Metalization for ULSI Applications 1992, ed. by Cale, T. S. and Pintchovski, F. S. (Mater. Res. Soc. Conf. Proc., Pittsburgh, PA, 1993) pp. 6772.Google Scholar
[2] Maniguet, L., Ignat, M., Dupeux, M., Normandon, Ph., Bacmann, J.J., in Thin Films-Stress and Mechanical Properties IV, ed. by Townsend, P.H., Sanchez, J., Li, C.Y., Weiths, T. P (Mater. Res. Soc. Symp. Proc. 308, Pittsburgh, PA, 1993).Google Scholar
[3] James, M. R. and Cohen, J. B., Treatise on Materials Science and Technology, Vol. 19A, ed. by Herman, H. (Academic Press, New York, 1980) pp. 162.Google Scholar
[4] Flinn, P. A. and Chiang, C., J. Appl. Phys., 67(6), pp. 29272931 (1990).Google Scholar
[5] Gergaud, P., Doctorate Thesis, ENSAM, Paris, 1992.Google Scholar
[6] Pichot, M., Durandet, A., Pelletier, J., Amal, Y. and Vallier, L., Rev. Sci. Instr., 52, pp. 10721075 (1988).Google Scholar
[7] Swanson, Tatge, Natl. Bur. Stand. (U.S.), Circ. 539, 128 (1953).Google Scholar
[8] Flinn, P. A., in Thin Films: Stresses and Mechanical Properties II, ed. by Doerner, M. F., Olivier, W. C., Pharr, G. M. and Brotzen, F. R. (Mater. Res. Soc. Symp. Proc. 188, Pittsburgh, PA, 1990) pp. 313.Google Scholar
[9] Sauter, A. I. and Nix, W. D., IEEE Trans. on Comp., Hybrids and Manu. Tech. 15(4), pp. 594600 (1992).Google Scholar
[10] Greenebaum, B., Sauter, A. I., Flinn, P. A. and Nix, W. D., Appl. Phys. Lett., 58, pp. 1845 (1991).Google Scholar