Hostname: page-component-cd9895bd7-gxg78 Total loading time: 0 Render date: 2024-12-22T01:13:43.853Z Has data issue: false hasContentIssue false
  • English
  • Français

Structural Stability of Heat Treated W/B4C Multilayers

Published online by Cambridge University Press:  28 February 2011

A.F. Jankowski
A.F. Jankowski*
Affiliation:
Lawrence Livermore National Laboratory, Chemistry & Materials Science, P.O. Box 808, Livermore, California 94550
Get access

Abstract

The utilization of W/B4C multilayer structures as Bragg diffractors rests in their reflective efficiency and dependability, both of which rely on the stability of the layered structure. The layers within the vapor deposited multilayers, often amorphous, are typically metastable, hence susceptible to thermally induced structural change. In fact, crystallization and compound formation are known to occur in annealed multilayer systems. In this study, multilayers of W/C and W/B4C were vacuum heat treated, then structurally examined. A comparison between the pre- and post- heat treated structures of the two multilayer systems, accomplished using diffraction and electron microscopy, indicate structural stability in the W/B4C multilayers as opposed to structural degradation noted for the W/C system.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 160 , 1989 , 611
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1Applications of Thin-Film Multilayered Structures to Figured X-Ray Optics, ed. Marshall, G.F., SPIE Proceedings Vol. 563 (1985).Google Scholar
2Multilayer Structures and Laboratory X-Ray Laser Research, ed. Ceglio, N.M. and Dhez, P., SPIE Proceedings Vol. 688 (1986).Google Scholar
3X-Ray Multilayers for Diffractometers, Monochromators, and Spectrometers, ed. Christensen, F.E., SPIE Proceedings 984 (1988).Google Scholar
4X-Ray/EUV Optics for Astronomy and Microscopy, ed. Hoover, R.B., SPIE Proceedings Vol. 1160 (1989).Google Scholar
5X-Ray Microscopy II, ed. Sayre, D., Howells, M., Kirz, J.; and Rarback, H., Springer Series in Optical Sciences Vol. 56 (Springer-Verlag, Berlin, 1988).Google Scholar
6Takagi, Y., Pawlik, D.A., Kadin, A.M., Flessa, S.A., Hart, K.L., Keem, J.E. and Tyler, J.E., Mater. Res. Soc. Symp. Proc. 56, 441 (1986).Google Scholar
7Kortright, J.B. and Denlinger, J.D.,Mater. Res. Soc. Symp. Proc. 139, 95 (1988).Google Scholar
8Nguyen, T.D., Gronsky, R. and Kortright, J.B., Mater. Res. Soc. Symp. Proc. 139, 357 (1989).Google Scholar
9Chang, C-H., Stearns, M.B. and Smith, D., Mater. Res. Soc. Symp. Proc. 139, 339 (1989).Google Scholar
10Barbee, T.W. Jr., in X-Rav Microscopy Vol. 43. (Springer-Verlag, Berlin, 1984) 144.Google Scholar
11Lamble, G.M., Heald, S.M., Sayers, D.E., Ziegler, E. and Viccaro, P.J., J. Appl. Phys. 65, 4250 (1989).Google Scholar
12Thorne, J.M., Knight, L.V., Peterson, B.G., Perkins, R.T. and Gray, K.J., SPIE Vol. 688, 139 (1986).Google Scholar
13Ruterana, P., Chevalier, J.-P. and Houdy, P., J. Appl. Phys. 65, 3907 (1989).Google Scholar
14Petford-Long, A.K., Stearns, M.B., Chang, C.-H., Nutt, S.R., Stearns, D.G., Ceglio, N.M. and Hawryluk, A.M., J. Appl. Phys. 61, 1422 (1987).Google Scholar
15Jankowski, A.F. and Makowiecki, D.M., SPIE Vol. 984, 64 (1988).Google Scholar
16Jankowski, A.F., Schrawyer, L.R., Wall, M.A., Craig, W.W., Morales, R.I. and Makowiecki, D.M., J. Vac. Sci. Technol. A7, 2914 (1989).Google Scholar
17Underwood, J.M. and Barbee, T.W. Jr., Appl. Opt. 20, 3027 (1981).Google Scholar
18Henke, B.L., Davis, J.C., Gullikson, E.M. and Perera, R.C.C., “A preliminary report on x-ray photoabsorption coefficients and atomic scattering factors for 92 elements in the 10-10,000 eV region”, LBL-26259, UC-411, (November 1988).Google Scholar
19Newcomb, S.B., Boothroyd, C.B. and Stobbs, W.M., J. Microscopy 140 (2), 195 (1985).Google Scholar
20Jankowski, A.F., SPIE Vol. 1160, 297 (1989).Google Scholar
21Ziegler, E., Lepetre, Y., Schuller, I.K. and Spiller, E., Appl. Phys. Lett. 48, 1354 (1986).Google Scholar