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Stress in Sputtered Co90Fe10/Ag GMR Multilayers

Published online by Cambridge University Press:  15 February 2011

J. D. Jarratt ,
V. R. Inturi ,
J. L. Weston  and
J. A. Barnard
J. D. Jarratt
Affiliation:
Department of Metallurgical and Materials Engineering and The Center for Materials for Information Technology, The University of Alabama, Tuscaloosa, Alabama 35487–0202.
V. R. Inturi
Affiliation:
Department of Metallurgical and Materials Engineering and The Center for Materials for Information Technology, The University of Alabama, Tuscaloosa, Alabama 35487–0202.
J. L. Weston
Affiliation:
Department of Metallurgical and Materials Engineering and The Center for Materials for Information Technology, The University of Alabama, Tuscaloosa, Alabama 35487–0202.
J. A. Barnard
Affiliation:
Department of Metallurgical and Materials Engineering and The Center for Materials for Information Technology, The University of Alabama, Tuscaloosa, Alabama 35487–0202.
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Abstract

Stress, giant magnetoresistance (GMR), structure, and magnetic properties of sputtered (Co90Fe10X Å/Ag Y Å)×20 multilayer films have been investigated at room temperature where X ranges from 7.5 to 25 Å and Y from 10 to 60 Å. These films exhibit distinct GMR behaviors dependent on individual layer thicknesses, including layered granular-type GMR in CoFe 7.5 Å samples and ‘discontinuous’ GMR (DGMR) in CoFe 15 and 25 Å samples with Ag thicknesses over 30 Å. No antiferromagnetic coupling was observed. CoFe 10 Å samples act as a transition between GMR behaviors. Compressive stress decreases with increasing Ag thickness in the CoFe 7.5 Å samples. In the CoFe 15 and 25 Å samples the stress fluctuates similarly depending on Ag thickness. The difference in stress and MR behavior between the CoFe 7.5 Å and the 15 and 25 Å samples is thought to be due to incomplete CoFe layering in the CoFe 7.5 Å samples. In the CoFe 15 Å DGMR samples, high temperature annealing resulted in tensile stresses large enough to cause film detachment. X-ray diffraction reveals a strong (111) growth texture as well as satellite peaks from coherent layering. This (111) texture is also evidenced by patterns with hexagonal symmetry formed by the detached films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 436: Symposium CC – Thin Films Stresses and Mechanical Properties VI , 1996 , 461
Copyright
Copyright © Materials Research Society 1997

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References

[1] Baibich, M. N. et al., Phys. Rev. Lett. 61, 2472 (1988).Google Scholar
[2] Binasch, G., Grünberg, P., Saurenbach, F., Zinn, W., Phys. Rev. B. 39, 4828 (1989).Google Scholar
[3] Parkin, S. S. P., More, N., and Roche, K. P., Phys. Rev. Lett. 61, 2304 (1990). S. S. P. Parkin, Phys. Rev. Lett. 67, 3598 (1991).Google Scholar
[4] Araki, S., Yasui, K., and Narumiya, Y., J. Phys. Soc. Japan 60, 2827 (1991).Google Scholar
[5] Mosca, D. H. et al., J. Magn. Magn. Mater. 93, 480 (1991).Google Scholar
[6] Barnard, J. A. et al., J. Magn. Magn. Mater. 114, L230 (1992).Google Scholar
[7] Xiao, J. C., Jiang, J. S., and Chien, C. L., Phys. Rev. Lett. 68, 3749 (1992).Google Scholar
[8] Berkowitz, A. E., et al., Phys. Rev. Lett. 68, 3745 (1992).Google Scholar
[9] Loloee, R., Schroeder, P. A., Pratt, W. P. Jr., Bass, J., and Fert, A., Physica B. 204, 27 (1995).Google Scholar
[10] Alphen, E. A. M. van and Jonge, W. J. M. de, Phys. Rev. B. 51, 8182 (1995).Google Scholar
[11] Redon, O., et al., J. Magn. Magn. Mater. 149, 398 (1995).Google Scholar
[12] Dimitrov, D. V., Murthy, A. S., and Hadjipanayis, G. C., Mater. Sci. Engin. A204, 25 (1995).Google Scholar
[13] Jarratt, J. D. and Barnard, J. A., IEEE Trans. Mag. 31, 3952 (1995).Google Scholar
[14] Jarratt, J. D. and Bamard, J. A., J. Appl. Phys. (in press).Google Scholar
[15] Jarratt, J. D. and Barnard, J. A., Mater. Res. Soc. Symp. Proc. 1995, (in press).Google Scholar
[16] Jarratt, J. D. and Barnard, J. A., IEEE Trans. Mag. (to be published).Google Scholar
[17] Hylton, T. L., Coffey, K. R., Parker, M. A., and Howard, J. K., Science 261, 1021 (1993).Google Scholar
[18] Stoney, G. G., Proc. Roy. Soc. 82, 172 (1909).Google Scholar
[19] Hoffman, R. W., Physics of Thin Films, Vol.3, Academic Press, New York, 211 (1966).Google Scholar