Hostname: page-component-78c5997874-8bhkd Total loading time: 0 Render date: 2024-11-18T01:14:05.580Z Has data issue: false hasContentIssue false
  • English
  • Français

A Second-Harmonic Generation Study of GaAs-Oxide Removal Using a Hydrogen Plasma

Published online by Cambridge University Press:  22 February 2011

Takahiro Kimura  and
Chikashi Yamada
Takahiro Kimura
Affiliation:
Optoelectronics Technology Research Laboratory 5-5 Tohkodai, Tsukuba, Ibaraki 300–26, Japan
Chikashi Yamada
Affiliation:
Optoelectronics Technology Research Laboratory 5-5 Tohkodai, Tsukuba, Ibaraki 300–26, Japan
Get access

Abstract

We observed a second-harmonic generation (SHG) in reflection from a GaAs (100) surface during an oxide removal process using a pulsed hydrogen plasma. We found that the P-polarized SH intensity under P-polarized excitation decreased in the [011] azimuth of incidence and increased in the [011] azimuth of incidence during hydrogen plasma irradiation. The input polarization angle dependence of the P-polarized SH intensity before and after oxide removal was fitted to a model which includes both the surface and bulk SHG contributions. We estimated the thickness of the removed oxide based on the bulk SHG contribution change.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 340: Symposium E – Compound Semiconductor Epitaxy , 1994 , 207
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Heinz, T.F., in Nonlinear Surface Electromagnetic Phenomena. eds. Ponach, H.E. and Stegeman, G.I., (North-Holland, Ansterdam, 1991), p.353.Google Scholar
2. Stehlin, T., Feller, M., Guyot-Sionnest, P. and Shen, Y.R., Opt. Letters, 13, 389 (1989).Google Scholar
3. Armstrong, S.R., Hoarse, R.D., Pemble, M.E., Povey, I.M., Stafford, A. and Taylor, A.G., J. Crys. Growth, 120. 94 (1992); 130,323 (1993); C.Yamada and T. Kimura, J. Crys. Growth., 130, 321 (1993).Google Scholar
4. Pemble, M.E., Stafford, A. and Taylor, A.G., Appl. Surf. Sci., 54, 490 (1992).Google Scholar
5. Yamada, C. and Kimura, T., Phys. Rev. Lett., 70, 2344 (1993).Google Scholar
6. Yamada, C. and Kimura, T., to be published in, J. Vac. Sci. Technol.Google Scholar
7. Zhang, T.G., Zhang, C.H. and Wong, G.K., J. Opt. Soc. Am., R2,902 (1990).Google Scholar
8. Bloembergen, N. and Pershan, P.S., Phys. Rev., 138, 606 (1963).Google Scholar
9. Aspnes, D.E., in Optical Properties of Solids: New Development, ed. Seraphin, B.O., (North-Holland, Amsterdam, 1976), p.799.Google Scholar
10. Grovenor, C.R.M. and Cerezo, A., J. Appl. Phys., 65, 5089 (1989).Google Scholar