Hostname: page-component-78c5997874-4rdpn Total loading time: 0 Render date: 2024-11-17T18:04:23.476Z Has data issue: false hasContentIssue false

Role of Impurities in Reducing Grown-in Dislocations in Compound Semiconductor Crystals

Published online by Cambridge University Press:  03 September 2012

Koji Sumino*
Affiliation:
Institute for Materials Research, Tohoku University, Sendai 980, Japan
Get access

Abstract

lmpurity effects on the mobility of dislocations and dislocation generation from generation centers in III - V compound semiconductor crystals are first reviewed on the basis of experimental observations of dynamic behavior of individual dislocations. Dislocation multiplication process is then discussed to account for experimental stress-strain characteristics of these materials obtained in mechanical tests. Using all of such knowledge on dislocation processes in the compound semiconductor crystals, an argument is developed to show how impurities play the role in reducing grown-in dislocations in crystals of these materials. It is shown that immobilization of dislocations caused by impurity gettering plays the decisive role and results in even the growth of dislocation-free crystals.

Type
Research Article
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Sumino, K., Defects in Semiconductors II (MRS Symposia Proceedings vol. 14), eds. Mahajan, S. and Corbett, J. W., (North-Holland, Amsterdam, 1983), p. 307.Google Scholar
[2] Sumino, K., Point and Extended Defects in Semiconductors, eds. Benedek, G., Cavallini, A. and Schröter, W., (Plenum, New York, 1989), p. 77.Google Scholar
[3] Sumino, K., Proc. 9th Internatl. Conf. on Positron Annihilation, Szombathely, 1991, in press.Google Scholar
[4] Koguchi, M., Yonenaga, I. and Sumino, K., Jpn. J. Appl. Phys. 21, L411 (1982).Google Scholar
[5] Imai, M. and Sumino, K., Philos. Mag. A47, 599 (1983).Google Scholar
[6] Sumino, K. and Imai, M., Philos. mag. A47, 753 (1983).Google Scholar
[7] Sato, M. and Sumino, K., Proc. Yamada Conf. on Dislocations in Solids, eds. Suzuki, H., Ninomiya, T., Sumino, K. and Takeuchi, S., (Univ. Tokyo Press, Tokyo, 1985), p. 391.Google Scholar
[8] Yonenaga, I. and Sumino, K., Proc. Yamada Conf. on Dislocations in Solids, eds. Suzuki, H., Ninomiya, T., Sumino, K. and Takeuchi, S., (Univ. Tokyo Press, Tokyo, 1985), p. 385.Google Scholar
[9] Yonenaga, I., Sumino, K. and Yamada, K., Appl. Phys. Lett. 48, 326 (1986).Google Scholar
[10] Sekiguchi, T. and Sumino, K., Jpn. J. Appl. Phys. 26, L179 (1987).Google Scholar
[11] Yonenaga, I. and Sumino, K., J. Appl. Phys. 62, 1212 (1987).Google Scholar
[12] Yonenaga, I. and Sumino, K., J. Appl. Phys. 65, 85 (1989).Google Scholar
[13] Yonenaga, I. and k. Sumino, Proc. 3rd Internatl. Conf. on InP and Related Materials, ed. Riley, T., (IEEE Lasers and Electro Optics Society and IEEE Electron Devices Society, 1991), p. 648.Google Scholar
[14] Seki, Y., Watanabe, H. and Matsui, J., J. Appl. Phys. 49, 822 (1978).Google Scholar
[15] Mil'vidskii, M. G., Osvenskii, V. B. and Shifrin, S. S., J. Cryst. Growth 52, 396 (1981).CrossRefGoogle Scholar
[16] Bol'sheva, Y. N., Grigor'ev, Y. A., Grishina, S. P., Mil'vidskii, M. G., Osvenskii, V. B. and Shifrin, S. S., Sov. Phys. Crystallogr. 27, 433 (1982).Google Scholar
[17] Jacob, G., Deseaux, M., Farges, J. P., van den Boom, M. M. B. and Roksnoer, P. J., J. Cryst. Growth 61, 417 (1983).CrossRefGoogle Scholar
[18] Kohda, H., Yamada, K., Nakanishi, H., Kobayashi, T., Osaka, J. and Hoshikawa, K., J. Cryst. Growth 71, 813 (1985).Google Scholar
[19] Ibuka, T., Seta, Y., Tanamura, M., Orito, F., Okano, T., Hyuga, F. and Osaka, J., Semi-Insulating III-V Materials, eds. Kukimoto, H. and Miyazawa, S., (Ohm and North-Holland, Tokyo and Amsterdam, 1986), p. 77.Google Scholar
[20] Tohno, S., Kubota, E., Shinoyama, S., Katsui, A. and Uemura, C., Jpn. J. Appl. Phys. 23, L72 (1984).Google Scholar
[21] Shimada, T., Terashima, K., Nakajima, H. and Fukuda, T., Jpn. J. Appl. Phys. 22, L23 (1983).Google Scholar
[22] Jordan, A. S., Caruso, R. and von Neida, A. R., Bell System Tech. J. 59, 593 (1980).CrossRefGoogle Scholar
[23] Tabache, M. G., Bourret, E. D. and Elliot, A. G., Appl. Phys. Lett. 49, 289 (1986).Google Scholar
[24] Völkl, J. and Müller, G., J. Crsyt. Growth 97, 136 (1989).Google Scholar
[25] Maroudas, D. and Brown, R., J. Crsyt. Growth 108, 399 (1991).Google Scholar
[26] Peissker, E., Haasen, P. and Alexander, H., Philos. Mag. 7, 1279 (1962).Google Scholar
[27] Yonenega, I. and Sumino, K., Phys. Stat. Sol. (a) 50, 685 (1978).Google Scholar
[28] Suezawa, M., Sumino, K. and Yonenaga, I., Phys. Stat. Sol. (a) 51, 217 (1979).Google Scholar
[29] Sumino, K. and Yonenaga, I., Solid State Phenomena Vol. 19&20 (Gettering and Defect Engineering in Semiconductor Technology '91), eds. Kittler, M. and Richter, H., 1991, p. 295.Google Scholar
[30] Kitano, T., Ishikawa, T., Ono, H. and Matsui, J., Jpn. J. Appl. Phys. 25, L530 (1986).Google Scholar
[31] Kitano, T., Ono, H. and Matsui, J., Jpn. J. Appl. Phys. 25, L761 (1986).Google Scholar
[32] Ono, H., J. Cryst. Growth 89, 209 (1988).Google Scholar
[33] Yonenaga, I. and Sumino, K., Appl. Phys. Lett. 58, 48 (1991).Google Scholar
[34] Yonenaga, I. and Sumino, K., J. Cryst. Growth (Proc. Internatl. Workshop on Characterization of Semiconductor Substrates and Structures, Smolenice, 1992), in press.Google Scholar