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Multilayered Metallic Thin Films Prepared by Dual-Bath Electrodeposition

Published online by Cambridge University Press:  28 February 2011

C.A. Ross ,
L.M. Goldman  and
F. Spaepen
C.A. Ross
Affiliation:
Harvard University, Division of Applied Sciences, McKay Laboratory, Oxford St., Cambridge, MA 02138
L.M. Goldman
Affiliation:
Harvard University, Division of Applied Sciences, McKay Laboratory, Oxford St., Cambridge, MA 02138
F. Spaepen
Affiliation:
Harvard University, Division of Applied Sciences, McKay Laboratory, Oxford St., Cambridge, MA 02138
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Abstract

Electrodeposition is a fast and relatively inexpensive method for making metal multi-layered films. We present a dual bath electrodeposition technique capable of producing crystalline Ni/amorphous NiPx multilayers with repeat lengths of 20Å and above, of sufficient quality to give several low-angle x-ray reflections. The compositional and structural modulations of the films are analysed using x-ray diffraction and microscopy, and the effects of deposition parameters, such as the current density, are examined.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 160 , 1989 , 571
Copyright
Copyright © Materials Research Society 1990

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