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Modeling Interdiffusion in Superlattice Structures

Published online by Cambridge University Press:  10 February 2011

Richard G. Gass
Affiliation:
Department of Physics, University of Cincinnati, Cincinnati, OH 45220-0011
Howard E. Jackson
Affiliation:
Department of Physics, University of Cincinnati, Cincinnati, OH 45220-0011
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Abstract

Compositional interdiffusion in Al0.3 Ga0.7 As/GaAs superlattices induced by Si focused ion beam implantation and subsequent rapid thermal annealing is modeled using a set of diffusion equations which take into account the dynamics of the vacancy spatial profile. The inclusion of a new phenomenological term, which depends on the time derivative of the vacancy concentration spatial profile, provides good agreeement with experiment.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

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