Skip to main content Accessibility help

Low Temperature Preparation of Y‐Ba‐Cu‐0 High Tc Superconducting Thin Films by Plasma‐Enhanced Organometallic Chemical Vapor Deposition

  • Jing Zhao (a1) (a2), Henry O. Marcy (a3), Lauren M. Tonge (a4), Bruce W. Wessels (a1) (a5), Tobin J. Marks (a4) (a5) and Carl R. Kannewurf (a3) (a5)...


We report here a plasma‐enhanced organometallic chemical vapor deposition process for the preparation of YBa2Cu3O7‐x thin films using two rf plasma coupling configurations. For the films grown under a direct plasma glow, the YBa2Cu3O7‐x phase is not found in the as‐deposited state. However, by employing plasma‐activated nitrous oxide as the reactant gas, superconducting YBa2Cu3O7‐x films having a low carbon content and a mirror‐like surface have been prepared in‐situ at a substrate temperature of 610°C using an organometallic chemical vapor deposition process.



Hide All
1 Zhao, J., and Wessels, B.W., unpublished.
2 Zhao, J., Dahmen, K.H., Marcy, H.O., Tonge, L.M., Marks, T.J., Wessels, B.W., and Kannewurf, C.R. Appl. Phys. Lett. 53, 1750 (1988)
3 Bai, G.R., Tao, W., Wang, R., Xie, L.M., Zhang, X.K., Hang, J., Qian, C.T., Zhou, W.K., Ye, C.Q., Ren, J.G., Li, Y.Q., Luo, W.M., and Chen, J.B. Appl. Phys. Lett. 55,194 (1989)
4 Handbook of Thin‐Film Deposition Processes and Techniques, edited by K.K. Schuegraf, Noyes Publication (1988)
5 Wu, X.D., Inam, A., Hegde, M.S., Wilkens, B., Chang, C.C., Hwang, D.M., Nazar, L., Venkatesan, T., Miura, S., Matsubara, S., Miyasaka, Y., and Shohata, N. Appl. Phys. Lett. 54, 754 (1989)
6 Suhr, H., Oehr, C., Holzshuh, H., Schmaderer, F., Wahl, G., Kruck, T., and Kinnen, A. Physica C. 153‐155, 784 (1988)


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed