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Low Temperature Preparation of Y‐Ba‐Cu‐0 High Tc Superconducting Thin Films by Plasma‐Enhanced Organometallic Chemical Vapor Deposition

  • Jing Zhao (a1) (a2), Henry O. Marcy (a3), Lauren M. Tonge (a4), Bruce W. Wessels (a1) (a5), Tobin J. Marks (a4) (a5) and Carl R. Kannewurf (a3) (a5)...

Abstract

We report here a plasma‐enhanced organometallic chemical vapor deposition process for the preparation of YBa2Cu3O7‐x thin films using two rf plasma coupling configurations. For the films grown under a direct plasma glow, the YBa2Cu3O7‐x phase is not found in the as‐deposited state. However, by employing plasma‐activated nitrous oxide as the reactant gas, superconducting YBa2Cu3O7‐x films having a low carbon content and a mirror‐like surface have been prepared in‐situ at a substrate temperature of 610°C using an organometallic chemical vapor deposition process.

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1 Zhao, J., and Wessels, B.W., unpublished.
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4 Handbook of Thin‐Film Deposition Processes and Techniques, edited by K.K. Schuegraf, Noyes Publication (1988)
5 Wu, X.D., Inam, A., Hegde, M.S., Wilkens, B., Chang, C.C., Hwang, D.M., Nazar, L., Venkatesan, T., Miura, S., Matsubara, S., Miyasaka, Y., and Shohata, N. Appl. Phys. Lett. 54, 754 (1989)
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