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Laser-Assisted Deposition of Fe and W: Photodecomposition of Fe(CO)5, and W(CO)6 on Si(111)-(7×7)*

Published online by Cambridge University Press:  26 February 2011

Jon R. Swanson ,
C.M. Friend  and
Y.J. Chabal
Jon R. Swanson
Affiliation:
Harvard University, Dept. of Chemistry, 12 Oxford St., Cambridge, MA 02138
C.M. Friend
Affiliation:
Harvard University, Dept. of Chemistry, 12 Oxford St., Cambridge, MA 02138
Y.J. Chabal
Affiliation:
AT&T Bell Labs, 600 Mountain Ave., Murray Hill, NJ 07974
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Abstract

The laser-assisted chemical vapor deposition (LCVD) of Fe and W on Si(lll)-(7×7) was investigated under ultrahigh vacuum conditions at 120 K. Multiple internal reflection Fourier transform infrared and Auger electron spectroscopies and temperature programmed desorption and low energy electron diffraction were used to study the adsorption and decomposition of Fe(C0)5 and w(C0)6 on the surface. Neither of the molecules thermally reacts in temperature programmed desorption experiments. Reversible molecular desorption is exclusively observed. Decomposition of both molecules via electronic excitation was induced by ultraviolet, but not visible photons. This was shown by measuring the photodecomposition yield as a function of wavelength. Visible photolysis (λ=720 nm) had no observable effect on either molecule. No surface stable, partially decarbonylated, Fe(C0), x<5, fragments observable with infrared spectroscopy were produced by photolysis. Also, no new features were observed in temperature programmed desorption experiments and only iron was detected on the surface after photolysis. In contrast, initial results indicate that photolysis of W(C0)fi does produce surface stable, W(C0), x<6, fragments.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 201
Copyright
Copyright © Materials Research Society 1998

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Footnotes

*

Part of this work was supported by the NSF (#CHE-83-09455) and (#CHE-84-51307) and the Harvard University Materials Research Lab (NSF DMR-83-169790).

References

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