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In-Situ Quality Control of the Production of Semiconductor Devices by Microwave Photoconductivity Measurements

Published online by Cambridge University Press:  25 February 2011

C. Swiatkowski ,
A. Sanders ,
M. Kunst ,
G. Seidelmann ,
C. Haffer  and
K. Emmelmann
C. Swiatkowski
Affiliation:
Dept Si: Solare Energetik Hahn-Meitner-Institut, Glienicker Strafle 100, 1000 Berlin 39, Germany
A. Sanders
Affiliation:
Dept Si: Solare Energetik Hahn-Meitner-Institut, Glienicker Strafle 100, 1000 Berlin 39, Germany
M. Kunst
Affiliation:
Dept Si: Solare Energetik Hahn-Meitner-Institut, Glienicker Strafle 100, 1000 Berlin 39, Germany
G. Seidelmann
Affiliation:
Dept D1: Software-Technik Hahn-Meitner-Institut, Glienicker Strafle 100, 1000 Berlin 39, Germany
C. Haffer
Affiliation:
Dept D1: Software-Technik Hahn-Meitner-Institut, Glienicker Strafle 100, 1000 Berlin 39, Germany
K. Emmelmann
Affiliation:
Dept D1: Software-Technik Hahn-Meitner-Institut, Glienicker Strafle 100, 1000 Berlin 39, Germany
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Abstract

The application of transient photoconductivity measurements in the microwave frequency range to the characterization of semiconductors and semiconductor devices is analyzed. Quality control and in-situ optimization are discussed from a more general point of view and as a concrete example the optimization of the deposition of amorphous silicon films is presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 269: Symposium L – Microwave Processing of Materials III , 1992 , 491
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

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[2] Kunst, M. and Werner, A., J. Appl. Phys. 58, 2236 (1985)CrossRefGoogle Scholar
[3] Madan, A. and Shaw, M.P., The Physics and Anplications of Amorphous Semiconductors, (Academic Press, Boston, 1988).Google Scholar
[4] Neitzert, H.-C. and Kunst, M., to be publishedGoogle Scholar
[5] Kunst, M. and Neitzert, H.-C., J. Appl. Phys. 69, 8320, (1991)CrossRefGoogle Scholar
[6] Kunst, M.,Neitzert, H.-C. and Ruebel, H., Phys. Rev. B 44,1081 (1991)CrossRefGoogle Scholar