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Initial Buffer Layers on the Growth of InGaP on Si by MBE

  • H. Kawanami (a1), S. Ghosh (a1), I. Sakata (a1) and T. Sekigawa (a1)

Abstract

Single domain InxGa(1-x)P (x=0.3) films were successfully grown on Si(001) misoriented substrates by molecular beam epitaxy with a solid phosphorous source. The effects of interfacial buffer layers such as InGaP (i.e. direct growth without buffer layer), GaP, AlP, and GaAs were examined. Also a Si epitaxial buffer layer was tried to control the Si surface structure. Mirror like surfaces were obtained for all films with RHEED patterns of (2×1) single domain surface structure. PL intensities for all films indicated almost the same values except for the films with a Si epitaxial buffer layer. The films with a Si epitaxial buffer layer had almost three times larger PL intensities than the films without Si epitaxial buffer layer. The results suggest incomplete cleaning of the Si surface by the high temperature (1000 °C) treatment and possibility of surface structure control for Si substrates by a Si epitaxial buffer layer.

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[1] Fan, J. C. C., Tsaur, B-Y., and Palm, B. J., Proc. 16th IEEE Photovoltaic Specialist Conf., Florida, p. 693 (1982).
[2] Nell, M. E. and Barnett, A. M., Proc. 18th IEEE Photovoltaic Specialist Conf., Las Vegas, p. 116 (1985).
[3] Komatsu, Y., Hosotani, K., Fuyuki, T., and Matsunami, H., Solar Energy Materials and Solar Cells 35, 33 (1994).
[4] Nishi, S., Inomata, H., Akiyama, M. and Kaminishi, K., Jpn. J. Appl. Phys. 24, L391 (1984).
[5] Fisher, R., Masselink, W. T., Klem, J., Henderson, T., McGlinn, T. C., Klein, M. V., Morkoq, H., Mazur, J. H., and Washborn, J., J. Appl. Phys. 58, 374 (1985).
[6] Sugo, M. and Yamaguchi, M., Appl. Phys. Lett. 54, 1754 (1989).
[7] Kondo, S., Nagai, H., Itoh, Y., and Yamaguchi, M., Appl. Phys. Lett. 55, 1961 (1989).
[8] Kawanami, H. and Sekigawa, T. in Evolution of Epitaxial Structure and Morphology, edited by Zangwill, A., Jesson, D., Chambliss, D., and Clarke, R. (Mat. Res. Soc. Proc. 399, Pittsburgh, PA 1996), p. 147.
[9] Kawanami, H., Sakamoto, T., Takahashi, T., Suzuki, E., and Nagai, K., Jpn. J. Appl. Phys. 21, L68 (1982).
[10] Wright, S. L., Kroemer, H., and Inada, M., J. Appl. Phys. 55, 2916 (1984).
[11] Kawanami, H. and Hayashi, Y., J. Crystal Growth 95, 117 (1989).
[12] Kawanami, H., Ishihara, S., Nagai, K. and Hayashi, Y., Jpn. J. Appl. Phys. 25, L419 (1986).
[13] Kobayashi, H. and Kawabe, M., Jpn. J. Appl. Phys. 29, L1342 (1990).
[14] Kitahara, K., Ohtsuka, N., and Ozeki, M., J. Vac. Sci. & Technol. B7, 700 (1989)
[15] Mori, H., Tachikawa, M., Sogo, M., and Itoh, Y., Appi. Phys. Lett. 63, 1963 (1993).

Initial Buffer Layers on the Growth of InGaP on Si by MBE

  • H. Kawanami (a1), S. Ghosh (a1), I. Sakata (a1) and T. Sekigawa (a1)

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