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Effect of Substrate Materials on Mechanical Properties and Microstructure of Carbon Nitride Films Prepared by Ion-beam-assisted deposition

Published online by Cambridge University Press:  17 March 2011

Hidenobu Ohta
Affiliation:
Nagoya University, Department of Microsystem Engineering, Nagoya, Aichi, 4648603, Japan
Akihito Matsumuro
Affiliation:
Nagoya University, Department of Microsystem Engineering, Nagoya, Aichi, 4648603, Japan
Yutaka Takahashi
Affiliation:
Mie University, Department of Mechanical Engineering, Tsu, Mie, 5148507, Japan
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Abstract

Carbon nitride (C-N) thin films were prepared on several substrates by ion-beam-assisted deposition technique. In this experiment, carbon was evaporated by electron beam. Nitrogen and argon ion beams were bombarded simultaneously. Aluminum alloy (7075), high-carbon chrome bearing steel (SUJ2), pure titanium plates (99.5%) and Si(100) wafer were used as substrates. Here, mechanical properties, such as hardness, adhesion, friction coefficient and wear resistance were investigated. These results show the adhesion between the films and substrates were improved by formation of the carbon layer. The microstructure of the carbon nitride films were investigated by cross sectional high-resolution transmission electron microscopy (HRTEM).

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

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