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Chemical Vapor Deposition of Copper From Metal-Organic Copper(I) Phosphine Complexes

Published online by Cambridge University Press:  21 February 2011

H.-K. Shin
Affiliation:
Departments of Chemistry, University of New Mexico, Albuquerque, NM 87131 Center for Micro-Engineered Ceramics, University of New Mexico, Albuquerque, NM 87131
M.J. Hampden-Smith
Affiliation:
Departments of Chemistry, University of New Mexico, Albuquerque, NM 87131 Center for Micro-Engineered Ceramics, University of New Mexico, Albuquerque, NM 87131
T.T. Kodas
Affiliation:
Chemical Engineering, University of New Mexico, Albuquerque, NM 87131 Center for Micro-Engineered Ceramics, University of New Mexico, Albuquerque, NM 87131
E.N. Duesler
Affiliation:
Departments of Chemistry, University of New Mexico, Albuquerque, NM 87131
J.D. Farr
Affiliation:
CLS-1 Los Alamos National Laboratories, Los Alamos, NM 87545.
M. Paffett
Affiliation:
CLS-1 Los Alamos National Laboratories, Los Alamos, NM 87545.
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Abstract

A series of new, molecular copper(I) compounds with the general formula (β-diketonate)Cu(PMe3) have been prepared which are specifically designed as precursors for the CVD of copper. These species have been designed such that the effects of systematic ligand variations on the CVD process can be examined. The series of derivatives where β-diketonate is one of hexafluoroacetylacetonate, 3, trifluoroacetylacetonate, 4, or acetylacetonate, 5, have been prepared in high yield and are described here. A solid state X-ray diffraction study of 3 reveals that it is monomeric. Cryoscopic molecular weight determination and gas phase FTIR spectroscopy are also consistent with a monomeric structure in liquid and gas phases. Hot-wall CVD of copper from these precursors has been examined under various conditions. Auger electron spectroscopy indicates that the films all exhibit some degree of carbon contamination, but little contamination by oxygen, fluorine or phosphorus.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

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