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Sputter Roughening Instability on the Ge(001) Surface: Energy and Flux Dependence

Published online by Cambridge University Press:  21 February 2011

E. Chason ,
T.M. Mayer  and
B.K. Kellerman
E. Chason
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
T.M. Mayer
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
B.K. Kellerman
Affiliation:
Sandia National Laboratories, Albuquerque, NM 87185
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Abstract

We have measured surface roughening kinetics during low energy Xe ion sputtering of Ge (001) surfaces. The results are interpreted in terms of an instability theory developed by Bradley and Harper [1]. Although the calculated magnitude of the roughening rate does not agree with the measured value, the variation of the rate with ion flux and energy is in agreement with the theory.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 396: Symposium A – Ion-Solid Interactions for Materials Modification and Processing , 1995 , 143
Copyright
Copyright © Materials Research Society 1996

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