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Novel Preparation Method of Thin Films by Ablation Plasma produced by Intense Pulsed Ion Beam Evaporation

Published online by Cambridge University Press:  17 March 2011

Kiyoshi Yatsui ,
Hisayuki Suematsu ,
Weihua Jiang ,
Tsuneo Suzuki ,
Sung-Chae Yang ,
Yoshiaki Kinemuchi ,
Makoto Hirai  and
Keizo Kato
Kiyoshi Yatsui
Affiliation:
Extreme-Energy Density Institute, Nagaoka Univ. of Technology, Nagaoka, Niigata 940-2188, JAPAN
Hisayuki Suematsu
Affiliation:
Extreme-Energy Density Institute, Nagaoka Univ. of Technology, Nagaoka, Niigata 940-2188, JAPAN
Weihua Jiang
Affiliation:
Extreme-Energy Density Institute, Nagaoka Univ. of Technology, Nagaoka, Niigata 940-2188, JAPAN
Tsuneo Suzuki
Affiliation:
Extreme-Energy Density Institute, Nagaoka Univ. of Technology, Nagaoka, Niigata 940-2188, JAPAN
Sung-Chae Yang
Affiliation:
Extreme-Energy Density Institute, Nagaoka Univ. of Technology, Nagaoka, Niigata 940-2188, JAPAN
Yoshiaki Kinemuchi
Affiliation:
Extreme-Energy Density Institute, Nagaoka Univ. of Technology, Nagaoka, Niigata 940-2188, JAPAN
Makoto Hirai
Affiliation:
Extreme-Energy Density Institute, Nagaoka Univ. of Technology, Nagaoka, Niigata 940-2188, JAPAN
Keizo Kato
Affiliation:
Graduate School of Science and Technology, Niigata University, Niigata 950-2181, Japan
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Abstract

A novel preparation method of thin films has been successfully developed by high-density ablation plasma produced by pulsed ion-beam evaporation method. The preparation is available with extremely high deposition rate (with cm/s), without heating the substrate, in a vacuum, with good stoichiometry. As an example, the preparation of phosphoresecent SrAl2O4:Eu, Dy thin films will be shown. Furthermore, a new method has been developed of the synthesis of ultrafine nanosize powders by use of microexplosion of pulsed wire discharge. As an example, the synthesis of NiFe2O4 powders will be shown, where two wires of nickel and iron were exploded by pulsed current. In addition, we have succeeded in the preparation of tungsten thin films within via holes in LSI by use of pulsed ion beam-evaporation method. In addition to the huge power per shot, a new machine has been developed of highly repetitive, pulsed power machine for the industrial applications.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 697: Symposium P – Surface Engineering 2001--Fundamentals and Applications , January 2001 , P4.9
Copyright
Copyright © Materials Research Society 2002

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References

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