Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-12-06T15:28:18.216Z Has data issue: false hasContentIssue false

A New Assembling Method for Nano-sized Particles Using an Electrified Pattern Drawn by a Focused Ion Beam

Published online by Cambridge University Press:  17 March 2011

Hiroshi Fudouzi
Affiliation:
5th Research Group, National Research Institute for Metals 1-2-1, Sengen, Tsukuba, Ibaraki 305-0047, Japan
Mikihiko Kobayashi
Affiliation:
5th Research Group, National Research Institute for Metals 1-2-1, Sengen, Tsukuba, Ibaraki 305-0047, Japan
Norio Shinya
Affiliation:
5th Research Group, National Research Institute for Metals 1-2-1, Sengen, Tsukuba, Ibaraki 305-0047, Japan
Get access

Abstract

This paper describes a new technique to fabricate two-dimensional microstructures assembled with nano-sized particles. The nano-sized particles attract a lot of attention because of their unique properties compared to bulk materials. Micro- and nano- structures assembled with nano-sized particles have potential applications in electronic, optical and biochemical fields. The Self-Assembled Monolayer (SAM) film patterning is one of the methods to assemble the nano-sized particles. We have proposed a new method to assemble nano-sized particles on a substrate using an electric field generated by an electrified pattern. In this study, following our methods titanium oxide (TiO2, diam.=21nm) particles were patterned on an n-type (100) silicon substrate having an oxidized layer. The particle deposition on the substrates was carried out using a colloidal suspension process and an aerosol process.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

(1) Nagayama, K., Colloids Surf. A, 109, 363374 (1996).Google Scholar
(2) Xia, Y. and Whitesides, G.M., Angew. Chem. Int. Ed., 37, 550575 (1998).Google Scholar
(3) Palacin, S., Hidber, P.C., Bourgoin, J.P., Miramond, C., Fermon, C. and Whitesides, G.M., Chem. Mater., 8, 13161325 (1996).Google Scholar
(4) Sato, T., Hasko, D.G. and Ahmed, H., J. Vac. Sci. Technol. B, 15, 4548 (1997).Google Scholar
(5) Tien, J., Terfort, A. and Whitesides, G.M., Langmuir, 13, 53495355 (1997).Google Scholar
(6) Chen, K.M., Jiang, X., Kimerling, L.C. and Hammond, P.T., Langmuir, 16, 78257834 (2000).Google Scholar
(7) Aizenberg, J., Braun, P.V. and Wiltzius, P., Phy. Rev. Lett., 84, 29973000 (2000).Google Scholar
(8) Masuda, Y., Seo, W.S. and Koumoto, K., Jpn. J. Appl. Phys., 39, 45964600 (2000).Google Scholar
(9) Kim, E., Xia, Y. and Whitesides, G.M., Adv. Mater., 8, 245247 (1996).Google Scholar
(10) Fudouzi, H., Kobayashi, M., Egashira, M. and Shinya, N., Adv. Powder Technol., 8, 251262 (1997).Google Scholar
(11) Fudouzi, H., Kobayashi, M. and Shinya, N., Tran. MRS Jpn., 25, 123125 (2000).Google Scholar
(12) Schaffert, R.M., Electrophotography (Focal Press, 1965) pp. 362381.Google Scholar
(13) Fudouzi, H., Egashira, M. and Shinya, N., J. Electrostatics, 42, 4349 (1997).Google Scholar
(14) Jones, T.B., Electrtomechanics of Particles (Cambridge Univ. Press, 1995) pp. 533.Google Scholar
(15) Ziegler, J.F., Biersack, J.P. and Littmark, U., The Stopping and Range of Ions in Solids (Pergamon Press, 1985).Google Scholar
(16) Chrisey, D.B., Science, 289, 879880 (2000).Google Scholar