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Deposition of Thin Film SrFeO2.5+x by Pulsed Laser Ablation

Published online by Cambridge University Press:  01 January 1992

Brian W. Sanders  and
Michael L. Post
Brian W. Sanders
Affiliation:
National Research Council of Canada, Institute for Environmental Chemistry, Ottawa, Canada, KIA 0R6
Michael L. Post
Affiliation:
National Research Council of Canada, Institute for Environmental Chemistry, Ottawa, Canada, KIA 0R6
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Abstract

Pulsed laser ablation has been used to deposit thin perovskite films based on the formula: SrFeO2.5+x (x = 0 to ≈ 0.5). Good quality films have been deposited on (1102) and AT cut quartz substrates at temperatures ranging from 300 to 1130 K. Films grown below 770 K showed little or no preferential crystallinity. Temperatures around 913 K produced films predominantly oriented (200), while temperatures greater than 1000 K produced films with (110) orientation. Films were grown from pellets of two compositions (SrFeO2.5, and SrFeO≈3). The former had a higher ablation threshold than the latter. The atmosphere during cooling had a greater effect on the film's oxygen content than the growth atmosphere. Films cooled in vacuum had the brownmillerite structure (x=0), whereas films cooled in 53.3 kPa oxygen had the cubic perovskite structure (x≈0.5).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 285: Symposium I – Laser Ablation in Materials Processing–Fundamentals and Applications , 1992 , 427
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

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