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Nano-patterning on Si (100) surface under specific ion irradiation environment

Published online by Cambridge University Press:  15 March 2019

R. P. Yadav
Affiliation:
Department of Physics, Deen Dayal Upadhyay Govt. P.G. College, Saidabad, Allahabad221508, India
undefined Vandana
Affiliation:
Department of Physics, Kurukshetra University, Kurukshetra, 136119, India
Jyoti Malik
Affiliation:
Department of Physics, Government College for Women, Bahadurgarh, 124507, India
Jyoti Yadav
Affiliation:
Department of Physics, Indra Gandhi University Meerpur, Rewari, 123401, India
A. K. Mittal
Affiliation:
Department of Physics, University of Allahabad, Allahabad, 211002, India
Tanuj Kumar
Affiliation:
Department of Nanoscience and Materials, Central University of Jammu, Jammu, 180011, India
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Abstract

Nano-patterned surfaces have potential applications in the development of efficient solar cells through multiple internal reflections and may be used to fulfil the energy demand of rural India. Therefore, the basic understanding of growth mechanism of patterns under ion irradiation is much required. Here, the ripple patterns are grown on Si (100) surfaces for two specific ion irradiation conditions. First, the two set of samples (namely set-A and set-B) of Si (100) are irradiated by 50 keVAr+ ion beam at oblique (60°) and normal incidence, respectively, using ion fluence of 5×1016 ions/ cm2. The aim of this first stage irradiation at two different angles is the creation of different depth locations of amorphous/crystalline (a/c) interface while keeping the free surface similar in surface features, which is a crucial parameter in surface growth. Further, the sequential second stage irradiation is carried out at 60° for the same energy of Ar beam for the fluences 3×1017 to 9×1017 ions/cm2 to see the evolution of ripple patterns. Atomic force microscopy (AFM) study shows that the ripple pattern ordering is better in set-A rather than set-B. Lateral correlation length of each ripple structure surface is computed by autocorrelation function while roughness exponent is measured with height-height correlation function. Fractals behaviors of patterned on Si (100) surface are found to be sensitive to the two stage irradiation approach. The understanding of the mechanism of nano-patterns formation may be useful to develop efficient solar systems for the needs of energy in rural India.

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Copyright © Materials Research Society 2019 

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References

Kumar, T., Kumar, A., Kanjilal, D., An approach to tune the amplitude of surface ripple patterns, Applied Physics Letters, 103 (2013) 131604.CrossRefGoogle Scholar
Yadav, R., Kumar, T., Mittal, A., Dwivedi, S., Kanjilal, D., Fractal characterization of the silicon surfaces produced by ion beam irradiation of varying fluences, Applied Surface Science, 347 (2015) 706-712.CrossRefGoogle Scholar
Keller, A., Facsko, S., Ion-induced nanoscale ripple patterns on Si surfaces: theory and experiment, Materials, 3 (2010) 4811-4841.CrossRefGoogle ScholarPubMed
Kumar, T., Khan, S., Singh, U., Verma, S., Kanjilal, D., Formation of nanodots on GaAs by 50keV Ar+ ion irradiation, Applied Surface Science, 258 (2012) 4148-4151.CrossRefGoogle Scholar
Chini, T.K., Datta, D.P., Bhattacharyya, S.R., Ripple formation on silicon by medium energy ion bombardment, Journal of Physics: Condensed Matter, 21 (2009) 224004.Google ScholarPubMed
Kumar, T., Kumar, M., Verma, S., Kanjilal, D., Fabrication of ordered ripple patterns on GaAs (100) surface using 60 keV Ar+ beam irradiation, Surface Engineering, 29 (2013) 543-546.CrossRefGoogle Scholar
Katharria, Y. S., Kumar, Sandeep, Lakshmy, P. S., and Kanjilal, D., Self-organization of 6H‐SiC (0001) surface under keV ion irradiation, Journal of Applied Physics 102 (2007) 044301CrossRefGoogle Scholar
Katharria, YS, Kumar, S, Sharma, AT, Kanjilal, D, Nano- and micro-scale patterning of Si (1 0 0) under keV ion irradiation, Applied Surface Science 253 (16) (2007) 6824-6828CrossRefGoogle Scholar
Avasthi, D.K., Mehta, G.K., Swift heavy ions for materials engineering and nanostructuring, Springer Science & Business Media, 2011.Google Scholar
Khan, S.A., Avasthi, D.K., Agarwal, D.C., Singh, U.B., Kabiraj, D., Quasi-aligned gold nanodots on a nanorippled silica surface: experimental and atomistic simulation investigations, Nanotechnology, 22 (2011) 235305.CrossRefGoogle ScholarPubMed
Toma, A., Chiappe, D., Massabo, D., Boragno, C., Buatier de Mongeot, F., Self-organized metal nanowire arrays with tunable optical anisotropy, Applied Physics Letters, 93 (2008) 163104.CrossRefGoogle Scholar
Oates, T., Keller, A., Noda, S., Facsko, S., Self-organized metallic nanoparticle and nanowire arrays from ion-sputtered silicon templates, Applied physics letters, 93 (2008) 063106.CrossRefGoogle Scholar
KV, S., Kumar, D., Gupta, A., Growth study of Co thin film on nanorippled Si (100) substrate, Applied Physics Letters, 98 (2011) 123111.Google Scholar
Nazari, Masoumeh, Ali, Masoudi, Jafari, Parham, Irajizad, Peyman, Kashyap, Varun, and Ghasemi, Hadi, Ultrahigh Evaporative Heat Fluxes in Nanoconfined Geometries, Langmuir, 35 (1), (2019) 7885CrossRefGoogle ScholarPubMed
Rickman, A., The commercialization of silicon photonics, Nature Photonics, 8 (2014) 579-582.CrossRefGoogle Scholar
Smirnov, V., Kibalov, D., Orlov, O., Graboshnikov, V., Technology for nanoperiodic doping of a metal–oxide–semiconductor field-effect transistor channel using a self-forming wave-ordered structure, Nanotechnology, 14 (2003) 709.CrossRefGoogle Scholar
Kumar, T., Singh, U., Kumar, M., Ojha, S., Kanjilal, D., Tuning of ripple patterns and wetting dynamics of Si (100) surface using ion beam irradiation, Current Applied Physics, 14 (2014) 312-317.CrossRefGoogle Scholar
Yadav, R., Kumar, T., Baranwal, Vandana, V., Kumar, M., Priya, P., Pandey, S., Mittal, A., Fractal characterization and wettability of ion treated silicon surfaces, Journal of Applied Physics, 121 (2017) 055301.CrossRefGoogle Scholar
Hong, L., Wang, X., Zheng, H., Wang, H., Yu, H., Femtosecond laser fabrication of large-area periodic surface ripple structure on Si substrate, Applied Surface Science, 297 (2014) 134-138.CrossRefGoogle Scholar
Bhadra, Chris M., Werner, Marco, Baulin, Vladimir A., Khanh Truong, Vi, Kobaisi, Mohammad Al, Nguyen, Song Ha, Balcytis, Armandas, Juodkazis, Saulius, James, Y. Wang, David E. Mainwaring, Crawford, Russell J., Ivanova, Elena P., Subtle Variations in Surface Properties of Black Silicon Surfaces Influence the Degree of Bactericidal Efficiency, Nano-Micro Lett. (2018) 10: 36CrossRefGoogle ScholarPubMed
Li, X, Bactericidal mechanism of nanopatterned surfaces, Physical Chemistry Chemical Physics 18(2) (2016) 1311-1316.CrossRefGoogle ScholarPubMed
Körner, M., Lenz, K., Liedke, M., Strache, T., Mücklich, A., Keller, A., Facsko, S., Fassbender, J., Interlayer exchange coupling of Fe/Cr/Fe thin films on rippled substrates, Physical Review B, 80 (2009) 214401.CrossRefGoogle Scholar
Bradley, R.M., Harper, J.M., Theory of ripple topography induced by ion bombardment, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 6 (1988) 2390-2395.CrossRefGoogle Scholar
Rost, M., Krug, J., Anisotropic Kuramoto-Sivashinsky equation for surface growth and erosion, Physical review letters, 75 (1995) 3894.CrossRefGoogle ScholarPubMed
Cuerno, R., Makse, H.A., Tomassone, S., Harrington, S.T., Stanley, H.E., Stochastic model for surface erosion via ion sputtering: Dynamical evolution from ripple morphology to rough morphology, Physical Review Letters, 75 (1995) 4464.CrossRefGoogle ScholarPubMed
Kim, T., Ghim, C.-M., Kim, H., Kim, D., Noh, D., Kim, N., Chung, J., Yang, J., Chang, Y., Noh, T., Kinetic roughening of ion-sputtered Pd (001) surface: beyond the Kuramoto-Sivashinsky model, Physical review letters, 92 (2004) 246104.CrossRefGoogle ScholarPubMed
Kumar, T., Kumar, A., Agarwal, D.C., Lalla, N.P., Kanjilal, D., Ion beam-generated surface ripples: new insight in the underlying mechanism, Nanoscale research letters, 8 (2013) 1-5.CrossRefGoogle ScholarPubMed
Kumar, T., Kumar, M., Panchal, V., Sahoo, P., Kanjilal, D., Energy-separated sequential irradiation for ripple pattern tailoring on silicon surfaces, Applied Surface Science, 357 (2015) 184-188.CrossRefGoogle Scholar
Singh, U.B., Yadav, R.P., Pandey, R.K., Agarwal, D.C., Pannu, C., Mittal, A.K., Insight mechanisms of surface structuring and wettability of ion-treated Ag thin films, The Journal of Physical Chemistry C, 120 (2016) 5755-5763.CrossRefGoogle Scholar
Pelliccione, M., Lu, T.-M., Evolution of Thin-Film Morphology, Springer, 2008.Google Scholar
Yadav, R., Kumar, M., Mittal, A., Pandey, A., Fractal and multifractal characteristics of swift heavy ion induced self-affine nanostructured BaF2 thin film surfaces, Chaos: An Interdisciplinary Journal of Nonlinear Science, 25 (2015) 083115.CrossRefGoogle Scholar
Yadav, R., Kumar, M., Mittal, A., Dwivedi, S., Pandey, A.C., On the scaling law analysis of nanodimensional LiF thin film surfaces, Materials Letters, 126 (2014) 123-125.CrossRefGoogle Scholar
Datta, D.P., Chini, T.K., Atomic force microscopy study of 60− keV Ar-ion-induced ripple patterns on Si (100), Physical Review B, 69 (2004) 235313.CrossRefGoogle Scholar

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