Hostname: page-component-78c5997874-xbtfd Total loading time: 0 Render date: 2024-11-18T18:49:31.453Z Has data issue: false hasContentIssue false
  • English
  • Français

On the grain size and coalescence stress resulting from nucleation and growth processes during formation of polycrystalline thin films

Published online by Cambridge University Press:  31 January 2011

Carl V. Thompson
Carl V. Thompson
Affiliation:
Max-Planck-Institut für Metallforschung, Stuttgart, Germany
Get access

Abstract

When polycrystalline films form by nucleation, growth, impingement, and coalescence of islands on a substrate surface, the grain size at impingement depends on the relative magnitudes of the nucleation rate, the growth rate, and the dimension of the zone from which adatoms diffuse to a growing island. A simple description of the interdependence of these parameters is developed. It is used to discuss the dependence of the grain-size-at-impingement and the intrinsic stress resulting from coalescence on the deposition rate and the substrate temperature, and to discuss how these might affect texture evolution during film growth.

Type
Articles
Information
Journal of Materials Research , Volume 14 , Issue 7 , July 1999 , pp. 3164 - 3168
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1.Thornton, J.A., Annu. Rev. Mater. Sci. 7, 239 (1977).CrossRefGoogle Scholar
2.Hoffman, R.W., Surface Interface Anal. 3, 62 (1981).CrossRefGoogle Scholar
3.Nix, W.D. and Clemens, B.M., unpublished.Google Scholar
4.Neugebauer, C.A., in Handbook of Thin Film Technology, edited by Maissel, L.I. and Glang, R. (McGraw-Hill, 1970), Chap. 8.Google Scholar
5.Lewis, B. and Anderson, J.C., Nucleation and Growth of Thin Films (Academic Press, 1978).Google Scholar
6.Rhodin, T. and Walton, D., Transactions of 9th National Vacuum Symposium (MacMillon Company, New York, 1962), p. 3.Google Scholar
7.Christian, J.W., The Theory of Transformation in Metals and Alloys. 2nd ed. (Pergamon, 1975).Google Scholar
8.Tanemura, M., Ann. Inst. Statist. Math. 31, 351 (1979).CrossRefGoogle Scholar
9.Frost, H.J. and Thompson, C.V., Acta Metall. 35, 259 (1987).Google Scholar
10.Gilbert, E.N., Ann. Math. Statist. 33, 958 (1962).CrossRefGoogle Scholar
11.Frost, H.J., Thompson, C.V., Howe, C.L., and Whang, J.A., Scripta Metall. 22, 65 (1988).CrossRefGoogle Scholar
12.Thun, R., in Handbook of Thin Film Technology, edited by Maisal, L.I. and Glang, R. (McGraw-Hill, 1970).Google Scholar
13.Thun, R., in Physics in Thin Films, edited by Hass, G. (Academic Press, New York, 1964), Vol. 1, p. 187.Google Scholar
14.Floro, J.A., Thompson, C.V., Carel, R., and Bristowe, P.D., J. Mater. Res. 9, 241 (1994).CrossRefGoogle Scholar
15.Thompson, C.V. and Carel, R., J. Mech. Phys. Solids 44, 657 (1996).CrossRefGoogle Scholar
16.Grantscharova, E., Thin Solid Films 224, 28 (1993).CrossRefGoogle Scholar
17.Pelleg, J.A., Zevin, L.Z., Lungo, S., and Croitoru, N., Thin Solid Films 197, 117 (1991).CrossRefGoogle Scholar