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Nucleation of CVD-TiN on tungsten

Published online by Cambridge University Press:  03 March 2011

K. Glejb⊘l ,
N.H. Pryds  and
A.R. Thölén
K. Glejb⊘l
Affiliation:
Laboratory of Applied Physics, Technical University of Denmark, DK-2800 Lyngby, Denmark
N.H. Pryds
Affiliation:
Laboratory of Applied Physics, Technical University of Denmark, DK-2800 Lyngby, Denmark
A.R. Thölén
Affiliation:
Laboratory of Applied Physics, Technical University of Denmark, DK-2800 Lyngby, Denmark
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Abstract

Using Chemical Vapor Deposition (CVD), TiN was deposited on sharp tungsten needles. The reactant gases were TiCl4, N2, and H2. A Transmission Electron Microscopy (TEM) investigation revealed that the first nuclei of the CVD–TiN coating on tungsten did not consist of δ–TiN, but were a mixture of α–TiN and δ–TiN. These results were also verified with x-ray measurements. From these experimental results a possible mechanism for the initial growth of TiN on tungsten is suggested. It may be that the change in relative concentrations of the different titanium nitrides suggested as mechanism of the initial growth of CVD–TiN can be applied in general for all TiCl4/H2/N2/metal systems where the original substrate surface material partly or completely consists of a metal with catalytic properties.

Type
Articles
Information
Journal of Materials Research , Volume 8 , Issue 9 , September 1993 , pp. 2239 - 2244
Copyright
Copyright © Materials Research Society 1993

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References

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