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Thermal decomposition and fractal properties of sputter-deposited platinum oxide thin films

Published online by Cambridge University Press:  20 December 2011

Adolfo Mosquera
Affiliation:
Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, E-28049 Madrid, Spain
David Horwat
Affiliation:
Institut Jean Lamour, Ecole des Mines de Nancy, 54042 Nancy, France
Luis Vazquez
Affiliation:
Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, E-28049 Madrid, Spain
Alejandro Gutiérrez
Affiliation:
Departamento de Física Aplicada and Instituto Nicolás Cabrera, Universidad Autónoma de Madrid, E-28049 Madrid, Spain
Alexei Erko
Affiliation:
Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Elektronenspeicherring BESSY II, 12489 Berlin, Germany
André Anders
Affiliation:
Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720
Joakim Andersson
Affiliation:
The Angstrom Laboratory, Uppsala University, S-75121 Uppsala, Sweden
Jose L. Endrino*
Affiliation:
Abengoa Research, Campus Palmas Altas, E-41014 Sevilla, Spain
*
a)Address all correspondence to this author. e-mail: jose.endrino@research.abengoa.com
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Abstract

Porous platinum thin films were prepared by thermal decomposition at temperatures from 25 to 675 °C of platinum oxide films deposited by a pulsed reactive sputtering technique. The samples’ chemistry and structure were investigated by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), and x-ray absorption near edge structure (XANES), showing that the decomposition of the oxide begins as low as 400 °C and follows a sigmoidal trend with increasing annealing temperature. In the XRD spectra, only an amorphous-like signature was observed for temperatures below 575 °C, while Pt 4f XPS showed that the deposited oxide was a mixture of PtO2 and PtO. Pt-L3 edge XANES and Pt 4f XPS spectra showed that the Pt concentration and electronic structure are predominant for temperatures equal to or above 575 °C. The morphologies of the films were investigated by the area-perimeter method from atomic force microscopy and scanning electron microscopy (SEM) images, indicating that the surfaces exhibit a combination of Euclidian and fractal characteristics. Moreover, the thermal evolution of these characteristics indicates the agglomeration of the grains in the film as observed by SEM.

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Articles
Copyright
Copyright © Materials Research Society 2011

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