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Substrate bias effects during R-F sputtering of Y-Ba-Cu-O films

Published online by Cambridge University Press:  31 January 2011

A. J. Drehman  and
M. W. Dumais
A. J. Drehman
Affiliation:
Solid State Sciences Directorate, Rome Air Development Center, Hanscom AFB, Massachusetts 01731
M. W. Dumais
Affiliation:
Solid State Sciences Directorate, Rome Air Development Center, Hanscom AFB, Massachusetts 01731
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Abstract

Y-Ba-Cu-O films were made by R-F diode sputtering using a single oxide target. It was found that if a small negative bias is applied to the substrate, the etching associated with reactive sputtering is significantly reduced. This results in better composition control and uniformity, which are quite important for the formation of superconducting thin films. Films deposited on strontium titanate, when annealed in oxygen, become superconducting with zero resistance at 89 K.

Type
Rapid Communications
Information
Journal of Materials Research , Volume 5 , Issue 4 , April 1990 , pp. 677 - 679
Copyright
Copyright © Materials Research Society 1990

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References

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