Hostname: page-component-78c5997874-fbnjt Total loading time: 0 Render date: 2024-11-19T11:50:39.212Z Has data issue: false hasContentIssue false
  • English
  • Français

Zirconia Coatings Deposited by Inductively Coupled Plasma Assisted CVD

Published online by Cambridge University Press:  10 February 2011

P. Colpo ,
G. Ceccone ,
B. Leclercq ,
P. Salvatore  and
F. Rossi
P. Colpo
Affiliation:
European Commission, Joint Research Center, Institute for Health and Consumer Protection, Via E. Fermi, 1, 21020 Ispra (VA), Italy.
G. Ceccone
Affiliation:
European Commission, Joint Research Center, Institute for Health and Consumer Protection, Via E. Fermi, 1, 21020 Ispra (VA), Italy.
B. Leclercq
Affiliation:
European Commission, Joint Research Center, Institute for Health and Consumer Protection, Via E. Fermi, 1, 21020 Ispra (VA), Italy.
P. Salvatore
Affiliation:
European Commission, Joint Research Center, Institute for Health and Consumer Protection, Via E. Fermi, 1, 21020 Ispra (VA), Italy.
F. Rossi
Affiliation:
European Commission, Joint Research Center, Institute for Health and Consumer Protection, Via E. Fermi, 1, 21020 Ispra (VA), Italy.
Get access

Abstract

Thin films of zirconia have been deposited by an Inductively Coupled Plasma Assisted CVD (ICP-PACVD) reactor from tetra (tert-butoxy)-zircon precursor diluted in Ar and O2 gas mixture. An independent RF generator is used to control carefully the substrate negative bias voltage during the deposition. Zirconia thin films, with thickness up to 10 microns were deposited on Si (100) polished wafers under different plasma conditions. Correlation between deposition parameters, and microstructure has been established showing that the ion bombardment has a large influence on the coating characteristics. In particular, the possibility of tailoring mechanical properties of the films by controlling the applied DC bias voltage is discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 555: Symposium OO – Properties and Processing of Vapor-Deposited Coatings , 1998 , 191
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Helmus, M. N., Mat. Res. Soc. Bull. XVI (9), 33 (1992).Google Scholar
2. Smith, D. C., Pilliar, R. M., and Mclntre, N. S., Oral Implantology and Biomaterials, edited by Kawahara, H. (Elsevier, Amsterdam, 1989) p. 185.Google Scholar
3. Boorst, M. A., Lee, W. Y., Zhang, Y., and Liaw, P. K., J. Am. Ceram. Soc., 30 (6), 1591–94 (1997).Google Scholar
4. Reif, R., in Handbook of Plasma Processing Technology, edited by Rossnagel, S. M., J.J., Cuomo, W.D., Westwood, (Noyes Publications, 1990), p. 260.Google Scholar
5. Kim, E. T., Yoon, S. G., Thin solid films, 227, 7–12, (1993).Google Scholar
6. Gavillet, J. et al, Thin Solid films 301, 35–44, (1997).Google Scholar
7. Frenck, H.J. et al., Materials Science and Engineering, A139, 394–400, (1991).Google Scholar
8. Keller, J.H., Plasma Sources Sci. Technol. 5, 166–172 (1996).Google Scholar
9. Teufer., G., Acta Cristallogr., 15, 1187, (1962).Google Scholar
10. McMurdie, H., Powder Diffraction, 1,275 (1986).Google Scholar