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Uhv-Mocvd Growth and in Situ Characterization of Epitaxial TiO2 Films

Published online by Cambridge University Press:  25 February 2011

Samuel Chen ,
H. J. Gysling ,
G. R. Paz-Pujalt ,
T. N. Blanton ,
T. Castro ,
K. M. Chen ,
C. Fictorie ,
W. L. Gladfelter ,
A. Franciosi  and
P. I. Cohen
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Samuel Chen
Affiliation:
Eastman Kodak Company, Rochester, NY 14650–2132
H. J. Gysling
Affiliation:
Eastman Kodak Company, Rochester, NY 14650–2132
G. R. Paz-Pujalt
Affiliation:
Eastman Kodak Company, Rochester, NY 14650–2132
T. N. Blanton
Affiliation:
The Center for Interfacial Engineering, University of Minnesota, Minneapolis, MN 55455
T. Castro
Affiliation:
The Center for Interfacial Engineering, University of Minnesota, Minneapolis, MN 55455
K. M. Chen
Affiliation:
The Center for Interfacial Engineering, University of Minnesota, Minneapolis, MN 55455
C. Fictorie
Affiliation:
The Center for Interfacial Engineering, University of Minnesota, Minneapolis, MN 55455
W. L. Gladfelter
Affiliation:
The Center for Interfacial Engineering, University of Minnesota, Minneapolis, MN 55455
A. Franciosi
Affiliation:
The Center for Interfacial Engineering, University of Minnesota, Minneapolis, MN 55455
P. I. Cohen
Affiliation:
The Center for Interfacial Engineering, University of Minnesota, Minneapolis, MN 55455
J. F. Evans
Affiliation:
The Center for Interfacial Engineering, University of Minnesota, Minneapolis, MN 55455
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Abstract

Thin films of TiO2 were grown on SrTiO3 and Al2O3 using Ti(OC3H7)4 in the absence of any external oxygen source such as H2O or O2. On SrTiO3 (001), epitaxial anatase (001) formed even at temperatures (800 °C) above the anatase to rutile phase transition temperature. In situ reflection high energy electron diffraction (RHEED) was used to monitor structural evolution during growth, and the films were further characterized by Auger electron spectroscopy (AES), transmission electron microscopy (TEM), and x-ray diffraction. Reaction kinetics were monitored using mass spectrometry, and these results, combined with temperature-programmed reaction spectroscopy, gave some insight into the deposition process.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 280: Symposium B – Evolution of Surface and Thin Film Microstructure , 1992 , 173
Copyright
Copyright © Materials Research Society 1993

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References

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