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Structural properties of Si nanoclusters produced by thermal annealing of SiOx films

Published online by Cambridge University Press:  15 March 2011

Simona Boninelli ,
Fabio Iacona ,
Corrado Bongiorno ,
Corrado Spinella  and
Francesco Priolo
Simona Boninelli
Affiliation:
INFM-MATIS and Dipartimento di Fisica e Astronomia dell'Università di Catania, via SantaSofia 64, 95123 Catania, Italy
Fabio Iacona
Affiliation:
CNR-IMM, Sezione di Catania, Stradale Primosole 50, 95121 Catania, Italy
Corrado Bongiorno
Affiliation:
CNR-IMM, Sezione di Catania, Stradale Primosole 50, 95121 Catania, Italy
Corrado Spinella
Affiliation:
CNR-IMM, Sezione di Catania, Stradale Primosole 50, 95121 Catania, Italy
Francesco Priolo
Affiliation:
INFM-MATIS and Dipartimento di Fisica e Astronomia dell'Università di Catania, via SantaSofia 64, 95123 Catania, Italy
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Abstract

The structural properties of Si nanoclusters embedded in SiO2, produced by high temperature annealing of SiOx films, have been investigated by energy filtered transmission electron microscopy. The presence of amorphous nanostructures, not detectable by using dark field transmission electron microscopy, has been demonstrated. By taking into account also this contribution, a quantitative description of the evolution of the samples upon thermal annealing has been accomplished. In particular, the nanocluster mean radius and the density of amorphous and crystalline clusters have been determined as a function of the annealing temperature.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 817: Symposium L – New Materials for Microphotonics , 2004 , L6.12
Copyright
Copyright © Materials Research Society 2004

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