Hostname: page-component-76fb5796d-vfjqv Total loading time: 0 Render date: 2024-04-25T08:29:00.384Z Has data issue: false hasContentIssue false

Step Response of a-Si:H Photodiodes

Published online by Cambridge University Press:  15 February 2011

M. Mulato
Affiliation:
Department of Electrical Engineering, Princeton University, Princeton-NJ, 08544-5263, USA
M. Ramón
Affiliation:
Department of Electrical Engineering, Princeton University, Princeton-NJ, 08544-5263, USA
S. Wagner
Affiliation:
Department of Electrical Engineering, Princeton University, Princeton-NJ, 08544-5263, USA
Get access

Abstract

We correlate the dark current-transients of a-Si:H p-i-n photodiodes with solar cell performance and quantum efficiency. For devices with solar cell efficiency varying from 7.2 to 2.2 % subjected to ±1 V and a sampling frequency of 21 kHz: i) the reverse-bias charging time is shorter, with the initial charging time being reduced by ~ 1.5 μs, while the time for final current stabilization is reduced by - 5 μs.; ii) the forward-bias time for the onset of space charge limited current dominated regime is ~ 1 μs faster, the final current limit is achieved also in shorter time (~ 9 μs), and the individual final limit current is diminished by ~ 8 % due to carriers trapping, while the relative final limit current between different diodes is diminished by ~ 50 %.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Street, R. A., Hydrogenated Amorphous Silicon, Cambridge University Press, Cambridge, 1991, p.383.Google Scholar
2.ref 1, p. 367.Google Scholar
3. Payne, A. M., PhD Thesis, Department of Electrical Engineering, Princeton University, 1998.Google Scholar
4. Hack, M. and Street, R. A., J. Appl. Phys. 72(6), 23312339 (1992).Google Scholar
5. Popovic, P., Bassanese, E., Furlan, J., Smole, F., and Skubic, I., J. Non-Cryst. Solids 191, 184192 (1995).Google Scholar
6. Hack, M. and Shaw, J. G., Mat. Res. Soc. Symp. Proc. Vol. 219, 315320 (1991).Google Scholar
7. Carius, R., Becker, F., Brüggemann, R., and Wagner, H., J. Non-Cryst. Solids 198–200, 246250 (1996).Google Scholar
8. Lemmi, F. and Johnson, N.M., Appl. Phys. Lett. 74, 251253 (1999).Google Scholar
9. Yan, B., Adriaenssens, G.J., Eliat, A., and Han, D., J. Non-Cryst. Solids 190, 8594 (1995).Google Scholar
10. Schmid, G., Bernhard, N., and Schubert, M., J. Non-Cryst. Solids 198–200, 206209 (1996).Google Scholar
11. Han, D., Wang, K., and Silver, M., J. Non-Cryst. Solids 164–166, 339342 (1993).Google Scholar
12. Yan, B., Eliat, A., and Adriaenssens, G. J., Appl. Phys. Lett. 65(18), 23382340 (1994).Google Scholar
13. Hornsey, R.I., Aflatooni, K., and Nathan, A., Appl. Phys. Lett. 70, 32603262 (1997).Google Scholar
14. Vieira, M., Appl. Phys. Lett. 70, 220222 (1997).Google Scholar
15. Kazakova, L.P. and Lebedev, E.A., Semiconductors 32, 169173 (1998).Google Scholar
16. Kazakova, L.P., Lebedev, A.A., and Lebedev, E.A., Semiconductors 31, 517518 (1997).Google Scholar
17. Street, R.A., Appl. Phys. Lett. 57, 13341336 (1990). See also ref. [1] p.370.Google Scholar
18.Ifinal × ft2 (C/cm2)= -4.47 × 10-7 + 1.348 × 10-6 * d, where d is the film thickness in μm. For our diodes Ifinal × ft2 range from 1.7 x 10-8 down to 7 × 10-9 C/cm2, from diode A to C, respectively.Google Scholar