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The Role Of Steps On The Micro Structure Of Titanium-Oxide Films Deposited By Pld Onto (100) Mgo Surfaces

Published online by Cambridge University Press:  15 February 2011

Simon King
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, 421, Washington Av S.E., Minneapolis, MN 55455.
C. Barry Carter
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, 421, Washington Av S.E., Minneapolis, MN 55455.
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Abstract

The phenomenon of graphoepitaxy, whereby island nucleation occurs preferentially at steps, is a prime example of a manner in which the substrate morphology (and notably surface steps) can affect the microstructure of as-deposited thin-films. This paper provides a further illustration of the fundamental importance of the substrate morphology to the development of the thin-film microstructure, employing the example of TiO2 deposited by pulsed-laser deposition (PLD) directly onto specially prepared (100) MgO TEM foils. The same areas of these foils are imaged both before and after deposition.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

REFERENCES

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