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Post-Irradiation Annealing of Laser-Formed Silicide Layers

Published online by Cambridge University Press:  15 February 2011

M. Wittmer
Affiliation:
Brown Boveri Research Center, CH–5405, Baden, Switzerland
M. von Allmen
Affiliation:
Institute of Applied Physics, University of Bern, CH–3012, Bern, Switzerland
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Abstract

We have investigated the post-irradiation annealing effects of laser-formed Pt, Pd, Rh and Ni-silicides. It was found from Rutherford backscattering and x-ray analysis that compositional changes occur during subsequent high temperature annealing in a vacuum furnace. Generally, a single silicide phase tends to form at the expense of the other phases present following laser irradiation. The surviving phase is not necessarily identical to the end-phase found in a binary solid-state reaction couple of the same system.

Type
Research Article
Copyright
Copyright © Materials Research Society 1981

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References

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