Hostname: page-component-78c5997874-94fs2 Total loading time: 0 Render date: 2024-11-17T16:16:49.871Z Has data issue: false hasContentIssue false

Optical Switching and Photoluminescence in Erbium Implanted Vanadium Dioxide Thin Films

Published online by Cambridge University Press:  17 April 2013

Herianto Lim
Affiliation:
School of Physics, University of Melbourne, Parkville, Victoria, Australia.
Nikolas Stavrias
Affiliation:
School of Physics, University of Melbourne, Parkville, Victoria, Australia.
Jeffrey C. McCallum
Affiliation:
School of Physics, University of Melbourne, Parkville, Victoria, Australia.
Robert E. Marvel
Affiliation:
Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee, U.S.A.
Richard F. Haglund
Affiliation:
Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee, U.S.A.
Get access

Abstract

Vanadium dioxide (VO2) is a promising material for an optical switch due to the ultrafast and reversible transition between its two phases with contrasting optical, as well as electronic, properties. Meanwhile, erbium (Er3+) has been a standard optical amplifier for the current fiber-optic communication system. Hence, a combination of the two could be expected to make an optical switch capable of simultaneous optical amplification. In the present work, the optical switching and photoluminescence of Er-implanted VO2 were successfully demonstrated. Post-implantation annealing at 800°C or above was seen crucial for the activation of the Er centers in the VO2 crystals.

Type
Articles
Copyright
Copyright © Materials Research Society 2013

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Mott, N. F., Metal-Insulator Transitions, 2nd ed. (Taylor & Francis, London, 1990) p.122.CrossRefGoogle Scholar
Ruzmetov, D. and Ramanathan, S., in Thin Film Metal-Oxides: Fundamentals and Applications in Electronics and Energy, edited by Ramanathan, S. (Springer, New York, 2010) pp. 5194.CrossRefGoogle Scholar
Li, J. and Dho, J., Appl. Phys. Lett. 99, 231909 (2011).CrossRefGoogle Scholar
Morin, F. J., Phys. Rev. Lett. 3, 3436 (1959).CrossRefGoogle Scholar
Stefanovich, G., Pergament, A. and Stefanovich, D., J. Phys-Cons Mat. 12, 88378845 (2000).CrossRefGoogle Scholar
Ben-Messaoud, T., Landry, G., Gariepy, J. P., Ramamoorthy, B., Ashrit, P. V. and Haché, A., Opt. Commun. 281, 60246027 (2008).CrossRefGoogle Scholar
Arcangeletti, E., Baldassarre, L., Di Castro, D., Lupi, S., Malavasi, L., Marini, C., Perucchi, A. and Postorino, P., Phy. Rev. Lett. 98, 196406 (2007).CrossRefGoogle Scholar
Cavalleri, A., Tóth, Cs., Siders, C. W., Squier, J. A., Ráksi, F., Forget, P. and Kieffer, J., Phys. Rev. Lett. 87, 237401 (2001).CrossRefGoogle Scholar
Polman, A., Appl. Phys. Rev. 82, 139 (1997).CrossRefGoogle Scholar
Kenyon, A. J., Prog. Quant. Electron. 26, 225284 (2002).CrossRefGoogle Scholar
Petzing, J., Coupland, J. and Leach, R., Good Practice Guide No. 116. The Measurement of Rough Surface Topography using Coherence Scanning Interferometry, (National Physical Laboratory, Teddington, 2010).Google Scholar
Lee, J., Lect. Notes Comput. Sc., 24, 255269 (1983).Google Scholar
Xiang-Bai, C., J. Korean Phys. Soc. 58, 100104 (2011).Google Scholar
Heckman, E. M., Gonzalez, L. P., Guha, S., Barnes, J. O. and Carpenter, A., Thin Solid Films 518, 265268 (2009).CrossRefGoogle Scholar
Pan, M., Liu, J., Zhong, H., Wang, S., Li, Z., Chen, X. and Lu, W., J. Cryst. Growth. 268, 178183 (2004).CrossRefGoogle Scholar
Schilbe, P., Physica B. 316-317, 600602 (2002).CrossRefGoogle Scholar
Chang, Y. J., Kho, C. H., Yang, J. S., Kim, Y. S., Kim, D. H., Lee, J. S., Noh, T. W., Kim, H. and Chae, B. G., Thin Solid Films 486, 4649 (2005).CrossRefGoogle Scholar
Kim, H., Kim, B., Choi, S., Chae, B., Lee, Y. W., Driscoll, T., Qazilbash, M. M. and Basov, D. N., J. Appl. Phys. 107, 023702 (2010).CrossRefGoogle Scholar
Jones, A. C., Berweger, S., Wei, J., Cobden, D. and Raschke, M. B., Nano Lett. 10, 15741581 (2010).CrossRefGoogle Scholar
Bennett, H. E. and Porteus, J. O., J. Opt. Soc. Am. 51, 123129 (1961).CrossRefGoogle Scholar