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Mîcromagnetic Modeling of the Behavior of Magnetostrictive Films under Stress

Published online by Cambridge University Press:  01 February 2011

Y. C. Shu  and
J. H. Yen
Y. C. Shu
Affiliation:
Institute of Applied Mechanics, National Taiwan University, Taipei 106, Taiwan R.O.C.
J. H. Yen
Affiliation:
Institute of Applied Mechanics, National Taiwan University, Taipei 106, Taiwan R.O.C.
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Abstract

We study the effect of stress on the behavior of magnetostrictive films. Our approach is different from the conventional one which neglects the strain compatibility. Here, we include the kinematic constraint in our micromagnetic model and proposed to use the average to calculate the stress-induced magnetic field. The analytic formulation of magnetostrictive energy is derived which enables us to perform simulation at a large scale with few iteration steps. The simulation results show that the conventional approach is insufficient to predict magnetic domain patterns for materials with large magnetostriction, and the effect of intrinsic stress cannot be neglected.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 785: Symposium D – Materials and Devices for Smart Systems , 2003 , D13.4
Copyright
Copyright © Materials Research Society 2004

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References

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