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Microcrystalline Cubic Boron Nitride/Amorphous Hydrogenated Boron Nitride Mixed Phase Thin Films

Published online by Cambridge University Press:  28 February 2011

Shu-Han Lin  and
Bernard J. Feldman
Shu-Han Lin
Affiliation:
Department of Physics and the Center for Molecular Electronics, University of Missouri, St. Louis, MO 63121
Bernard J. Feldman
Affiliation:
Department of Physics and the Center for Molecular Electronics, University of Missouri, St. Louis, MO 63121
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Abstract

Transparent and insulating thin films have been grown by the plasma decomposition of B2H6, NH3, and H2, at a substrate temperature of 250°C. From chemical composition, transmission electron microscopy, infrared absorption, and optical absorption measurements, the thin films are determined to be a mixed phase of crystalline cubic boron nitride and amorphous hydrogenated boron nitride. Also, the films have significantly more boron than nitrogen, a large concentration of hydrogen, a very large bandgap, strong infrared aborption due to both hexagonal boron nitride and boron icosahedra, and good adhesion to various substrates.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 358: Symposium F – Microcrystalline and Nanocrystalline Semiconductors , 1994 , 817
Copyright
Copyright © Materials Research Society 1995

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References

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