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Low Energy Ion Bombardment and Microstructural Evolution in Thin Films

Published online by Cambridge University Press:  25 February 2011

Chih M. Yang  and
Harry A. Atwater
Chih M. Yang
Affiliation:
California Institute of Technology, Pasadena, CA 91125
Harry A. Atwater
Affiliation:
California Institute of Technology, Pasadena, CA 91125
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Abstract

A new approach to modeling the evolution of islands in thin films by growth and coarsening during ion bombardment is described. Solution of a continuity equation and matter conservation relation, coupled with interface-limited and diffusion-limited rate laws for island growth and coarsening allows the kinetics of island evolution to be modeled. Results from the model indicate distinct kinetic paths for island evolution during ion bombardment as a result of growth, enhanced diffusion, island dissociation and monomer sputtering.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 157: Symposium A – Beam-Solid Interactions: Physical Phenomena , 1989 , 31
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1 Adamov, M., Perovic, B., and Nenadovic, T., Thin Solid Films, 24, 89 (1974).Google Scholar
2 Marinov, M., Thin Solid Films, 46, 267 (1977).Google Scholar
3 Hasan, M-A., Knall, J., Barnett, S.A., Rockett, A., Sundgren, J-E., and Greene, J.E., J. Vac. Sci. Tech, B5, 1332 (1987)..Google Scholar
4 Dodson, B., Phys. Rev. 36, 1068 (1987).Google Scholar
5 Yang, CM. and Atwater, H.A., submitted to J. Appl. Phys.Google Scholar
6 Greene, J.E., CRC Critical Reviews in Solid State and Materials Science, 2,47 (1983).Google Scholar
7 Lifschitz, I.M. and Slyozov, V.V., J. Phys. Chem. Solids, 19, 35 (1961); C. Wagner, Z. Electrochem., 65, 581 (1961).Google Scholar
8 Chakraverty, B.K., J. Phys. Chem. Solids, 28, 2401 (1967).Google Scholar
9 Thompson, C.V., Acta. Metall., 36 2929 (1988).Google Scholar
10 Voorhees, P.W. and Glicksman, M.E., Acta Met., 32, 2001 (1984); P.W. Voorhees and M.E. Glicksman, Acta Met., 32, 2013 (1984).Google Scholar