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Electron Microscopy Studies and Image Simulation of the YBa2Cu3O7−x/ BaF2 Interface

Published online by Cambridge University Press:  15 February 2011

J. L. Lee
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
J. Silcox
Affiliation:
School of Applied and Engineering Physics, Cornell University, Ithaca, NY 14853
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Abstract

Images of the YBa2Cu3OT7−x (YBCO) / BaF2 interface obtained with a scanning transmission electron microscope (STEM) show a relatively wide (∼40 Å) band of contrast at the interface, despite attempts to orient the interface plane parallel to the beam. Simulation of STEM annular dark field (ADF) images of several different interface geometries suggests that strain is the dominant cause of this wide band of contrast at the interface. In particular, it is the dislocations which run normal to the beam direction which make a significant contribution to the width of the contrast band in the case of this YBCO / BaF2 interface. A line scan taken across the interface using energy dispersive X-ray spectrometry (EDX) suggests that there is no significant Ba concentration at the interface, indicating that Z-contrast is not the primary contrast mechanism in these ADF images of the YBCO / BaF2 interface.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

1. Vasquez, R. P., Foote, M. C., Hunt, B. D., and Barmer, J. B., Physica C, 207, 266 (1993).Google Scholar
2. Peters, C. H., Bemasek, S. L., Venkatesan, T., Pique, A., Harshavardhan, K. S., and Wu, Y., J. Appl. Phys., 74, 3194 (1993).Google Scholar
3. Lee, J. L., Weiss, C. A., Buhrman, R. A., and Silcox, J., presented at the 1993 MRS Fall Meeting, Boston, MA, 1993 (unpublished).Google Scholar
4. Wolf, D. and Jaszczak, J. A., in Materials Interfaces, edited by Wolf, D. and Yip, S. (Chapman and Hall, London, 1992) p. 364; R. W. Siegel, p. 433.Google Scholar
5. Shin, D.-H., Kirkland, E. J., and Silcox, J., Appl. Phys. Let., 55, 2456 (1989).Google Scholar
6. Muller, D., Tzou, Y., Raj, R., and Silcox, J., Nature, 366, 725 (1993).Google Scholar
7. Pennycook, S. J. and Jesson, D. E., Phys. Rev. Let., 64, 938 (1990); Ultramicroscopy, 37, 14 (1991).Google Scholar
8. Perovic, D. D., Rossouw, C. J., and Howie, A., Ultramicroscopy, 52, 353 (1993).Google Scholar
9. Liu, J. and Cowley, J. M., Ultramicroscopy, 52, 335 (1993).Google Scholar
10. Hillyard, S. and Silcox, J., Ultramicroscopy, 52, 325, (1993).Google Scholar
11. Hillyard, S. and Silcox, J. (submitted to Ultramicroscopy).Google Scholar
12. Spence, J. C. H., Zuo, J. M., and Lynch, J., Ultramicroscopy, 31, 233 (1989).Google Scholar
13. Egerton, R. F., Electron Energy Loss Spectroscopy in the Electron Microscope (Plenum Press, New York, 1986), p. 291.Google Scholar
14. Cowley, J. M. and Moodie, A. F., Acta. Cryst., 10, 609 (1957).Google Scholar
15. Goodman, P. and Moodie, A. F., Acta. Cryst., A30, 280 (1974).Google Scholar
16. Kirkland, E. J., Loane, R. F., and Silcox, J., Ultramicroscopy, 23, 77 (1987).Google Scholar
17. Kirkland, E. J., Loane, R. F., Xu, P., and Silcox, J., in Computer Simulation of Electron Microscope Diffraction and Images, edited by Krakow, W. and O'Keefe, M. (The Minerals, Metals, & Materials Society, Warrendale, PA, 1989), p. 13.Google Scholar
18. Gomoyunova, M. V., Pronin, I. I., Faradzhev, N. S., and Wolf, T., Phys. Solid State, 36, 1250 (1994).Google Scholar
19. Edwards, H. L., Markert, J. T., and Lozanne, A. L. De, Phys. Rev. Let., 69, 2967 (1992).Google Scholar
20. Tanaka, S., Nakamura, T., Tokuda, H., and Iiyama, M., Appl. Phys. Lett., 62, 3040 (1993).Google Scholar
21. Calandra, C. and Manghi, F., J. Electr. Spectrosc. Relat. Phenom., 66, 453 (1994).Google Scholar
22. Merwe, J. H. Van der, Proc. Phys. Soc., London, A63, 616 (1950); J. Appl. Phys., 34, 117 (1963).Google Scholar