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The Effect of Structural Relaxation on the Diffusion of Au in Amorphous Pd80Si20

Published online by Cambridge University Press:  25 February 2011

A. V. Wagner  and
F. Spaepen
A. V. Wagner
Affiliation:
Harvard University, Division of Applied Sciences, Cambridge, MA 02138, USA
F. Spaepen
Affiliation:
Harvard University, Division of Applied Sciences, Cambridge, MA 02138, USA
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Abstract

The diffusivity of Au in sputter-deposited amorphous Pd80Si20 has been measured by Rutherford backscattering spectrometry (RBS) between 275°C and 380°C. A new method based on scaling of the evolution of the variance of the concentration profile was used to analyze the data. The diffusivity was found to be independent of the Au concentration below 3 at.%. Structural relaxation causes a time dependence that is evident at short times. The kinetics of this relaxation can be described by the bimolecular relaxation model used in the analysis of viscous flow.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 279: Symposium A – Beam-Solid Interactions–Fundamentals and Applications , 1992 , 631
Copyright
Copyright © Materials Research Society 1993

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References

1. Wagner, A. V., Wu, D. T. and Spaepen, F., Mat. Res. Soc. Symp. Proc. 235, 65 (1992).Google Scholar
2. Chen, H. S., Kimerling, L. C., Poate, J. M. and Brown, W. L., Appl Phys Lett. 32, 461 (1978).Google Scholar
3. Akhtar, D., Cantor, B. and Cahn, R. W., Acta Metall. 30, 1571 (1982).Google Scholar
4. Bottger, J., Dyrbye, K., Pampus, K., Torp, B., and Wiene, P. H., Phys. Rev. B37, 9951 (1988).Google Scholar
5. Duine, P. A., Sietsma, J., van den Beukel, A. and Vredenberg, A. M., Nue. Inst. Metli. Phys. Res. B71, 445 (1992).Google Scholar
6. Wu, D. T., Private communications.Google Scholar
7. RUMP is a computer code distributed by Computer Graphics Service. Ithaca, New York. The Algorithm can be found in the following reference: Doolittle, L.R.. Nucl. Instr. Meth. Phys. Res. B. 9, 334 (1985).Google Scholar
8. Wu, D. T., Crucial Issues in Semiconductor Materials and Processing Technologies, edited by Coffa, S., Priolo, F., Rimini, E. and Poate, J. M., Proc. NATO-ASI Series, Kluwer, Dordrecht, The Netherlands 403 (1992).Google Scholar
9. Rosenblum, M. P., Spaepen, F., and Turnbull, D., Appl Phys. Lett, 37, 184 (1980).Google Scholar
10. Greer, A. L., Lin, C. -J. and Spaepen, F., Proc. 4th Int. Conf. on Rapidly Quenched Metals, ed. by Masumoto, T. and Suzuki, K., J. Inst. Metals, Sendai 1, 567 (1981).Google Scholar
11. Tsao, S. S. and Spaepen, F., Acta Metall, 33, 881 (1985).Google Scholar
12. Spaepen, F., Physics of Defects, in Les Houches Lectures XXXV (edited by Balian, R. el al.), North Holland, Amsterdam (1981).Google Scholar
13. Chen, H. S. and Turnbull, D. T., Acta Metall, 17, 1021 (1969).Google Scholar