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Texture and Grain Size of Permalloy Thin Films Sputtered on Silicon With Cr, Ta and SiO2 Buffer Layers

Published online by Cambridge University Press:  15 February 2011

P. Galtier ,
R. Jerome  and
T. Valet
P. Galtier
Affiliation:
Laboratoire Central de Recherches, THOMSON-CSF, Domaine de Corbeville, 91404 Orsay cedex, France
R. Jerome
Affiliation:
Laboratoire Central de Recherches, THOMSON-CSF, Domaine de Corbeville, 91404 Orsay cedex, France
T. Valet
Affiliation:
Laboratoire Central de Recherches, THOMSON-CSF, Domaine de Corbeville, 91404 Orsay cedex, France
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Abstract

We have investigated the structural properties of Ni80Fe20 thin films sputtered on silicon with Cr, Ta and SiO2 buffer layers using transmission electron microscopy. We observe a decrease of the grain size when Ta and SiO2 underlayers are used instead of Cr. Permalloy films deposited on Ta layers are strongly (111) textured while those grown on Cr and SiO2 are mostly randomly oriented. The results are discussed with respect to the nanostructure of both Ta, Cr and SiO2 underlayers and in relation to the variation of the magnetic softness observed in this system.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 343: Symposium H – Polycrystalline Thin Films - Structure, Texture, Properties and Applications , 1994 , 417
Copyright
Copyright © Materials Research Society 1994

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References

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