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Novel vapor phase method for making ultra thin conformal films of polytetrafluoroethylene (PTFE)

Published online by Cambridge University Press:  01 February 2011

Sushant Gupta ,
Arul Arjunan Chakkaravarthi ,
Rajiv Singh ,
Jeff Opalko  and
Deepika Singh
Sushant Gupta
Affiliation:
sushant3@ufl.edu, University of Florida, Materials Science & Engineering, 100 Rhines Hall, Dr. Singh Group, Gainesville, FL, 32611, United States, (352)846-2496
Arul Arjunan Chakkaravarthi
Affiliation:
arul@sinmat.com, University of Florida, Materials Science & Engineering, 100 Rhines Hall, Gainesville, FL, 32611, United States
Rajiv Singh
Affiliation:
rsing@mse.ufl.edu, University of Florida, Materials Science & Engineering, 100 Rhines Hall, Gainesville, FL, 32611, United States
Jeff Opalko
Affiliation:
opalko@sinmat.com, Sinmat Inc., 2153 Hawthorne Road,, Suite 129 (Box 2), Gainesville, FL, 32641, United States
Deepika Singh
Affiliation:
singh@sinmat.com, Sinmat Inc., 2153 Hawthorne Road,, Suite 129 (Box 2),, Gainesville, FL, 32641, United States
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Abstract

Ultra-thin conformal polytetrafluoroethylene (PTFE) films were prepared by a novel physical vapor technique i.e., pulsed electron deposition (PED) technique. Prepared PTFE or Teflon thin films show high degree of conformity on patterned substrates. Under optimized deposition conditions the films exhibit superhydrophobicity. The PED processed films were characterized using scanning electron microscopy (SEM) and atomic force microscopy (AFM) micrographs and the surface morphology and the conformal nature of the films were studied. The chemical nature and hydrophobicity were studied by FTIR and contact angle measurements, respectively.

Keywords

microelectro-mechanical (MEMS)physical vapor deposition (PVD)thin film
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 992: Symposium D – Deposition on Nonplanar Substrates , 2007 , 0992-D04-03
Copyright
Copyright © Materials Research Society 2007

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