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MOCVD of SrBi2Ta2O9 for Integrated Ferroelectric Capacitors

Published online by Cambridge University Press:  10 February 2011

Bryan C. Hendrix
Affiliation:
Advanced Technology Materials, Inc., 7 Commerce Dr., Danbury, CT 06810, bhendrix@ATMI.com
Frank Hintermaier
Affiliation:
Siemens AG, Otto-Hahn-Ring 6, D-81739 Munich, Germany
Debra A. Desrocherst
Affiliation:
Advanced Technology Materials, Inc., 7 Commerce Dr., Danbury, CT 06810, bhendrix@ATMI.com
Jeffrey F. Roedert
Affiliation:
Advanced Technology Materials, Inc., 7 Commerce Dr., Danbury, CT 06810, bhendrix@ATMI.com
Gautam Bhandarit
Affiliation:
Advanced Technology Materials, Inc., 7 Commerce Dr., Danbury, CT 06810, bhendrix@ATMI.com
Maggie Chappuist
Affiliation:
Advanced Technology Materials, Inc., 7 Commerce Dr., Danbury, CT 06810, bhendrix@ATMI.com
Thomas H. Baumt
Affiliation:
Advanced Technology Materials, Inc., 7 Commerce Dr., Danbury, CT 06810, bhendrix@ATMI.com
Peter C. Van Buskirkt
Affiliation:
Advanced Technology Materials, Inc., 7 Commerce Dr., Danbury, CT 06810, bhendrix@ATMI.com
Christine Dehm
Affiliation:
Siemens AG, Otto-Hahn-Ring 6, D-81739 Munich, Germany
Elke Fritsch
Affiliation:
Siemens AG, Otto-Hahn-Ring 6, D-81739 Munich, Germany
Nikolas Nagel
Affiliation:
Siemens AG, Otto-Hahn-Ring 6, D-81739 Munich, Germany
Wolfgang Honlein
Affiliation:
Siemens AG, Otto-Hahn-Ring 6, D-81739 Munich, Germany
Carlos Mazure
Affiliation:
Siemens AG, Otto-Hahn-Ring 6, D-81739 Munich, Germany
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Abstract

SrBi2Ta2O9 (SBT) is a promising material for ferroelectric random access memories (FERAM's) because it has high resistance to fatigue and imprint combined with low coercive field. Metalorganic chemical vapor deposition (MOCVD) offers the ability to produce high quality, conformai SBT films for both high and low density memory applications. An MOCVD process based on liquid delivery and flash vaporization has been developed which allows precise delivery of low vapor pressure precursors to the process. Precursor decomposition has been examined over a wide temperature range and the effects of process pressure have been examined. It is shown that Bi(thdb is superior to Bi(Ph)3 as a source of Bi, offering a wide decomposition window with compatible Sr and Ta precursors so that a simple, well-controlled, and repeatable process is achieved at low temperatures. Films with 90% conformallity have been grown on 0.6 μm structures with a 1:1 aspect ratio. The MOCVD process yields the fluorite phase, which is transformed to the ferroelectric layered perovskite phase upon annealing in oxygen. Dielectric constants (ε) of 200 and remanent polarization (2Pr)up to 16 μC/cm2 have been achieved on 150 mm wafers.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

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