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Liquid Injection MOCVD of Rare-Earth Oxides Using New Alkoxide Precursors

Published online by Cambridge University Press:  01 February 2011

Paul A. Williams
Affiliation:
Epichem Limited, Power Road, Bromborough, Wirral, Merseyside, CH62 3QF, UK
Anthony C. Jones
Affiliation:
Epichem Limited, Power Road, Bromborough, Wirral, Merseyside, CH62 3QF, UK Department of Chemistry, University of Liverpool, Liverpool, L69 7ZD, UK
Helen C. Aspinall
Affiliation:
Department of Chemistry, University of Liverpool, Liverpool, L69 7ZD, UK
Jeffrey M. Gaskell
Affiliation:
Department of Chemistry, University of Liverpool, Liverpool, L69 7ZD, UK
Paul R. Chalker
Affiliation:
Department of Materials Science and Engineering, University of Liverpool, Liverpool, L69 3BX, UK
Paul A. Marshall
Affiliation:
Department of Materials Science and Engineering, University of Liverpool, Liverpool, L69 3BX, UK
Yim F. Loo
Affiliation:
Department of Chemistry, University of Liverpool, Liverpool, L69 7ZD, UK
Lesley M. Smith
Affiliation:
Epichem Limited, Power Road, Bromborough, Wirral, Merseyside, CH62 3QF, UK
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Abstract

High purity lanthanum oxide and praseodymium oxide thin films (C< 1 at.-%) have been deposited by liquid injection MOCVD using the volatile alkoxide precursos [La(mmp)3] and [Pr(mmp)3] in toluene-solution (mmp = OCMe2CH2OMe). 1H NMR solution studies have shown that the addition of donor species, such as tetraglyme (CH3O(CH2CH2O)4CH3) or mmpH prevent molecular aggregation and help stabilise the precursors.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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References

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