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Investigation into the Thin-Film Fabrication of Intermetallic NiTi

Published online by Cambridge University Press:  21 February 2011

A. Peter Jardine ,
Hong Zhang  and
Lysa D. Wasielesky
A. Peter Jardine
Affiliation:
Dept. of Materials Science and Engineering, S.U.N.Y. at Stony Brook, Stony Brook, NY 11793
Hong Zhang
Affiliation:
Dept. of Materials Science and Engineering, S.U.N.Y. at Stony Brook, Stony Brook, NY 11793
Lysa D. Wasielesky
Affiliation:
Dept. of Materials Science and Engineering, S.U.N.Y. at Stony Brook, Stony Brook, NY 11793
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Abstract

Thin-films of Ni and Ti were formed by sputter co-deposition of Ni and Ti onto amorphous SiO2 and single crystal NaCl and Sapphire substrates. Films were characterized as follows: a) The chemical composition of the films was analysed by EDAX b) The gross morphology was examined by Scanning Electron Microscopy. c) The crystal phases were indentified by X-ray diffraction and Electron diffraction. Intermetallic NiTi has been identified in samples annealed in vacuo at 850°C. Annealing at 500°C in vacuum produced chemical separation of the Ni and Ti. This effect may be due to a narrow solidus region for the existence of NiTi and inhomogeneities due to uneven deposition of the Ni and Ti.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 187: Symposium J – Thin Film Structures and Phase Stability , 1990 , 181
Copyright
Copyright © Materials Research Society 1990

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References

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