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Highly Oriented NiTiCu Shape Memory Thin Films Grown by Molecular Beam Epitaxy

Published online by Cambridge University Press:  21 March 2011

R. Hassdorf
Affiliation:
Center of Advanced European Studies and Research (caesar), D-53111 Bonn, Germany
J. Feydt
Affiliation:
Center of Advanced European Studies and Research (caesar), D-53111 Bonn, Germany
R. Pascal
Affiliation:
Center of Advanced European Studies and Research (caesar), D-53111 Bonn, Germany
S. Thienhaus
Affiliation:
Center of Advanced European Studies and Research (caesar), D-53111 Bonn, Germany
M. Boese
Affiliation:
Universität Bonn, Institut für Anorganische Chemie, D-53117 Bonn, Germany
T. Sterzl
Affiliation:
Center of Advanced European Studies and Research (caesar), D-53111 Bonn, Germany
B. Winzek
Affiliation:
Center of Advanced European Studies and Research (caesar), D-53111 Bonn, Germany
M. Moske
Affiliation:
Center of Advanced European Studies and Research (caesar), D-53111 Bonn, Germany
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Abstract

We present a study demonstrating the capability for controlled shape memory thin film growth using molecular beam epitaxy. Here, NiTiCu alloy films were grown which are known to exhibit the martensitic transformation well above room temperature. Remarkably, the microstructure of these films was found to be very different compared to conventionally sputtered polycrystalline films: here, the crystallites are highly oriented within 3° along the film plane normal. Moreover, a splitting of the martensite orientation is detected indicating the selection of only two specific martensite variants. Mechanical stress measurements reveal a high ratio of recoverable stress even for films below 500 nm thickness. These results open up the possibility for tailoring microstructure and crystallographic orientation of shape memory thin films and thus suggest promising characteristics, especially in regard to their superelastic behavior.

Type
Research Article
Copyright
Copyright © Materials Research Society 2002

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References

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