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Gas-Phase and Surface Reactions of Decomposed Species In Catalytic Cvd

Published online by Cambridge University Press:  17 March 2011

Namiko Honda ,
Atsushi Masuda  and
Hideki Matsumura
Namiko Honda
Affiliation:
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), Asahidai, Tatsunokuchi, Ishikawa 923-1292, Japan
Atsushi Masuda
Affiliation:
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), Asahidai, Tatsunokuchi, Ishikawa 923-1292, Japan
Hideki Matsumura
Affiliation:
School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), Asahidai, Tatsunokuchi, Ishikawa 923-1292, Japan
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Abstract

Gas-phase and surface reactions of transported species decomposed on the catalyzer were investigated in catalytic CVD (Cat-CVD), often called hot-wire CVD, using a specially designed reactor tube. The phenomena were comparatively studied using H2- or He-diluted SiH4. It turned out that the control of gas flow through the catalyzer between the gas showerhead and the substrate is a key factor to obtain high uniformity in not only the film thickness but also the crystallinity for Si films prepared by Cat-CVD using the gas pressure above about 10 Pa and the gas-flow velocity faster than several m/s.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 609: Symposium A – Amorphous & Heterogeneous Silicon Thin Films – 2000 , 2000 , A19.1
Copyright
Copyright © Materials Research Society 1999

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References

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