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Formation of ordered arrays of gold particles on silicon and silicon-dioxide by nanoindentation patterning

Published online by Cambridge University Press:  31 January 2011

Simon Ruffell ,
Dinesh Kumar Venkatachalam ,
Avi Shalav  and
Robert G. Elliman
Simon Ruffell
Affiliation:
simon.ruffell@anu.edu.au, Australian National University, EME/RSPE, Canberra, Australian Capital Territory, 0200, Australia
Dinesh Kumar Venkatachalam
Affiliation:
Dinesh.Venkatachalam@anu.edu.au, Australian National University, Canberra, Australian Capital Territory, Australia
Avi Shalav
Affiliation:
avi.shalav@anu.edu.aua.shalav@gmail.com, The Australian National University, Electronic Materials Engineering, The Research School of Physical Sciences and Engineering, Building 60; ANU Campus, Canberra, Australian Capital Territory, 2602, Australia
Robert G. Elliman
Affiliation:
rob.elliman@anu.edu.au, Australian National University, Canberra, Australian Capital Territory, Australia
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Abstract

Ordered arrays of gold particles have been fabricated on gold-coated Si(100) surfaces by pre-patterning the surface with a nanoindenter. During thermal annealing the Au is observed to accumulate within the residual indents. Once nucleated, the Au particles grow at the expense of smaller surface particles via an Ostwald-ripening process. The size of the Au particles is controlled by the initial thickness of the deposited Au layer, the size of the indentation (which is controlled with a high degree of precision), and the annealing conditions. Particles of ˜200 nm dimensions are formed in indents of ˜1 μm dimensions whilst nanoparticles of ˜20 nm are observed in the smallest indents made (˜50 nm). We have also demonstrated patterning of Au by indentation of a Au layer sandwiched between two SiO2 films deposited on Si by plasma-enhanced chemical vapour deposition. Here, cracking of the SiO2 layer occurs allowing Au to diffuse to the surface at the indented locations during post-indentation annealing.

Keywords

nanoscalenano-indentationAu
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1228: Symposium KK – Nanoscale Pattern Formation , 2009 , 1228-KK13-05
Copyright
Copyright © Materials Research Society 2010

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References

1 Materials Research Society Bulletin, 2007. 32(5).Google Scholar
2 Gherasimova, M. Hull, R. Reuter, M. C. and Ross, F. M. Applied Physics Letters, 2008. 93: p. 023106.Google Scholar
3 Borgstrom, M. Zela, V. and Seifert, W. Nanotechnology, 2003. 14: p. 264.Google Scholar
4 Fuhrmann, Bodo et al. , Nanoletters, 2005. 5(12): p. 2524.Google Scholar
5 Nielson, Peter, Hassing, Soren, Alkbrektsen, Ole, Foghmoes, Soren and Morgen, Per, Journal of Physical Chemistry C, 2009. 113(32): p. 14165.Google Scholar
6 Santos, V. Luis De Los, Lee, Dongwook, Seo, Jiwon, Leon, F. Lizbet, Bustamante, D. Angel, Suzuki, Seiichi, Majima, Yutaka, Mitrelias, Thanos, Ionescu, Adrian and Barnes, Crispin H.W. Surface Science, 2009. 603: p. 2978.Google Scholar
7 Golan, Yuval, Margulis, Lev and Rubinstein, Israel, Surface Science, 1992. 264: p. 312.Google Scholar
8 Venables, John A. Surface Science, 1994. 299/300: p. 798.Google Scholar
9 Allmen, M. von, Lau, S.S. Maenpaa, M. and Tsaur, B.Y. Applied Physics Letters, 1980. 36: p. 205.Google Scholar
10 Ruffell, S. Venkatachalam, D. K. Shalav, A. and Elliman, R. G. unpublished.Google Scholar