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Fast Degradation with Pulsed Light of a-Si:H P-I-N Photodiodes

Published online by Cambridge University Press:  01 January 1993

J. Puigdollers
Affiliation:
Universitat de Barcelona. Departament de Física Aplicada i Electrònica, Avda Diagonal, 647. 08028 - Barcelona, (SPAIN)
J. Bertomeu
Affiliation:
Universitat de Barcelona. Departament de Física Aplicada i Electrònica, Avda Diagonal, 647. 08028 - Barcelona, (SPAIN)
J.M. Asensi
Affiliation:
Universitat de Barcelona. Departament de Física Aplicada i Electrònica, Avda Diagonal, 647. 08028 - Barcelona, (SPAIN)
J. Andreu
Affiliation:
Universitat de Barcelona. Departament de Física Aplicada i Electrònica, Avda Diagonal, 647. 08028 - Barcelona, (SPAIN)
J.C. Delgado
Affiliation:
Universitat de Barcelona. Departament de Física Aplicada i Electrònica, Avda Diagonal, 647. 08028 - Barcelona, (SPAIN)
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Abstract

Amorphous Silicon p-i-nphotodiodes were obtained by PECVD in a reactor with a rotating substrate holder. Reverse currents as low as 5 × 10−11 A/cm2 at a bias of − 2V were measured using a guard ring electrode to minimize lateral edge currents. The devices were degraded by a Xenon flash lamp in open circuit conditions. The kinetics of the degradation process was evaluated by studying the long time dark current transient under reverse bias.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

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