Hostname: page-component-586b7cd67f-dlnhk Total loading time: 0 Render date: 2024-12-06T18:21:05.182Z Has data issue: false hasContentIssue false
  • English
  • Français

The Decomposition of Methyltrichlorosilane in Hydrogen and Helium

Published online by Cambridge University Press:  15 February 2011

Thomas H. Osterheld  and
Mark D. Allendorf
Thomas H. Osterheld
Affiliation:
Sandia National Laboratories, Mail Stop 9052 Livermore, CA 94551-0969
Mark D. Allendorf
Affiliation:
Sandia National Laboratories, Mail Stop 9052 Livermore, CA 94551-0969
Get access

Abstract

Experimental measurements of the decomposition of methyltrichlorosilane (MTS), a common silicon carbide precursor, in a high-temperature flow reactor are presented. Methane, hydrogen chloride, and silicon tetrachloride are observed as products of the decomposition. Trapping experiments with acetylene and ethylene also detected SiCl3 as a decomposition product. Upper limits on the concentrations of any CH3Cl, HSiCl3, H2SiCl2, or H2C=SiCl2 which might form are provided. Quantitative measurements of product branching and MTS decomposition rates are presented. The results suggest a radical-chain mechanism for the decomposition in hydrogen but not in helium.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 363 , 1994 , 27
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Footnotes

*

Work supported by the Advanced Industrial Materials Program of the U.S. Dept. of Energy Office of Industrial Technologies.

References

1. Schlichting, J., Powder Metal. Inter. 12, 196, (1980).Google Scholar
2. Besmann, T. M., Sheldon, B. W., Lowden, R. A. and Stinton, D. P., Science 253, 1104, (1991).Google Scholar
3. Burgess, J. N. and Lewis, T. J., Chemistry and Industry 76, (1974).Google Scholar
4. Osterheld, T. H., Allendorf, M. D. and Melius, C. F., J. Phys. Chem. 98, 6995, (1994).Google Scholar
5. Fitch, W. L. and Sauter, A. D., Anal. Chem. 55, 832, (1983).Google Scholar
6. Lampe, F. W., Franklin, J. L. and Field, F. H., J. Am. Chem. Soc. 79, 6129, (1957).Google Scholar
7. Allendorf, M. D. and Osterheld, T. H., Chemical Vapor Deposition of Refractory Metals and Ceramics III, edited by Lee, W. Y., Gallois, B. M., Pickering, M. A., (Mater. Res. Soc. 363, Pittsburgh, PA, 1995) see paper in this volume.Google Scholar
8. Sakurai, H., in Free Radicals Vol. II, edited by Kochi, J. K., (John Wiley and Sons, New York, 1973) p. 782.Google Scholar