Hostname: page-component-78c5997874-fbnjt Total loading time: 0 Render date: 2024-11-18T08:52:29.408Z Has data issue: false hasContentIssue false
  • English
  • Français

Analysis of Hydrogen Passivation Mechanisms in Poly-Si TFT’s by Employing R.F. Plasma

Published online by Cambridge University Press:  26 February 2011

K. Y. Choi ,
Y. S. Kim ,
H.S. Choi ,
B.S. Bae  and
M. K. Han
K. Y. Choi
Affiliation:
Department of Electrical Engineering, Seoul National University, Seoul 151–742, KOREA
Y. S. Kim
Affiliation:
Department of Electrical Engineering, Myongji Univeristy, Kyonggi-do 449–728, KOREA
H.S. Choi
Affiliation:
Department of Electrical Engineering, Seoul National University, Seoul 151–742, KOREA
B.S. Bae
Affiliation:
Samsung Electronics Co., Kiheung, Yongin-Gun, Kyonggi-do 449–990, KOREA
M. K. Han
Affiliation:
Department of Electrical Engineering, Seoul National University, Seoul 151–742, KOREA
Get access

Abstract

The dominant pathways for hydrogen diffusion in poly-Si TFT’s are identified by analyzing the hydrogenation effect on the various device geometries. It is observed that the gate poly-Si thickness and channel width didn’t affect the hydrogenation. As the channel length was decreased down to 3 µm, threshold voltage was reduced and field effect mobility was increased significantly with hydrogeantion time. In the thick gate oxide (2000 Å, 4000 Å) poly-Si TFT’s, the device characteristics have been improved rapidly with hydrogenation time. The tail state density of thin gate oxide TFT wasn’t change by hydrgenation while that of thick gate oxide TFT was significantly reduced. Our experimental results may support the model that hydrogen atoms diffuse into the bulk of the active channel layer through the gate oxide and passivate the grain boundary and intragranular defects limitedly by gate oxide area.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 378: Symposium B – Defect and Impurity-Engineered Semiconductors and Devices , 1995 , 393
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Chiang, A., Huang, T.Y., Wu, I.-W. and Zarzycki, M. in Polysilicon Films and Interfaces, edited by Wong, C.Y., Thompson, C.V., and Tu, K.N. (Mater. Res. Soc. Symp. Proc, 106, Boston, MA, 1987) pp. 305–310 Google Scholar
2. Kamins, T.I. and Marcoux, P.J., IEEE Electron Device Lettter, vol. EDL–1, p.159, 1980 Google Scholar
3. Wu, I-Wei et al, IEEE Electron Device Letter, vol. 12, p. 181, 1991 Google Scholar
4. Kim, Y.S. et al., Jpn. J. Appl. Phys. vol. 33, p.649, 1994 Google Scholar
5. Jackson, W.B. et al., Appl. Phys. Lett., 61 p. 1670, 1992 Google Scholar
6. Mimurae, U. et al., J. Electrochem. Soc, 138, p.3420, 1991 Google Scholar
7. Fossum, J.G. et al., IEEE Trans. Electron Dev., ED–32 p.1878, 1985 Google Scholar