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Analysis of Thin Films and Multi-Layer Thin Films containing Light Elements by XRF

Published online by Cambridge University Press:  06 March 2019

M. Kaufmann ,
M. Mantler  and
F. Weber
M. Kaufmann
Affiliation:
Institute of Applied and Technical Physics Technical University, Vienna
M. Mantler
Affiliation:
Institute of Applied and Technical Physics Technical University, Vienna
F. Weber
Affiliation:
Lawrence Livermore National Laboratory
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Abstract

Analysis of multi-layer thin films by XRF, using the fundamental parameter method, is a common and accurate method to determine thicknesses and chemical structure, as long as the films contain no hght elements. As an attempt to further extend the method, we present experimental results from single layer films made of carbon and silicon nitride with thicknesses ranging from 100 Å to 1000 Å, from single layer films of cobalt and oxygen matrices with varying oxygen concentration, and from complex multi-layer structures made of a combination of palladium, copper and carbon. The experimental data show a significant deviation from the results computed by the standard fundamental parameter method.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 39: Forty-Fourth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1995 , 1995 , pp. 701 - 706
Copyright
Copyright © International Centre for Diffraction Data 1995

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