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Application of Multi-Layer Thin Film Analysis by X-ray Spectrometry Using the Fundamental Parameter Method

Published online by Cambridge University Press:  06 March 2019

Y. Kataoka  and
T. Arai
Y. Kataoka
Affiliation:
Rigaku Industrial Corporation Osaka, Japan
T. Arai
Affiliation:
Rigaku Industrial Corporation Osaka, Japan
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Extract

The fundamental parameter method for x-ray spectrometry has been used most commonly for bulk samples, because it permits an analysis utilizing a minimum number of standards, even for samples with complicated matrices. The need for the analysis of thin film materials, which includes multi-layer films, has been increasing in recent years along with the rapid progress of high technologies. However, there have been few reports that deal with the application of fundamental parameter methods to multi-layer thin films. There may be two situations in the analysis of thin films. In routine analysis of quality control applications, they usually require precise analysis. Fortunately, it is possible to prepare well characterized standards similar to the unknowns.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 33: Thirty-Eighth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1989 , 1989 , pp. 225 - 235
Copyright
Copyright © International Centre for Diffraction Data 1989

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