Research Article
Measurements of SiH3 and SiH2 Radical Densities in RF Silane Plasmas Using Laser Spectroscopic Techniques
- Published online by Cambridge University Press: 01 January 1993, 3
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Clusters in A Silane Glow Discharge: Mechanism of Their Formation and How to Avoid Them
- Published online by Cambridge University Press: 01 January 1993, 13
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In Situ Ellipsometric Observation of the Growth of Crystalline Silicon From Fluorinated Precursors
- Published online by Cambridge University Press: 01 January 1993, 19
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Ellipsometry Studies of (μc-Si:H/ZnO) and (μc-Si:H/a-Si:H) Interfaces in Magnetron Sputtering System
- Published online by Cambridge University Press: 01 January 1993, 25
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Effect of Gas Phase Hydrogen-Dilution on the Nucleation, Growth, and Interfaces Of a-Si1-xCx:H
- Published online by Cambridge University Press: 01 January 1993, 31
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Depletion Fraction of Silane and Dominant Neutral Radical in RF Glow Discharge in Silane
- Published online by Cambridge University Press: 01 January 1993, 37
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Sub-Surface Equilibration of Hydrogen with the a-Si:H Network Under Film Growth Conditions
- Published online by Cambridge University Press: 01 January 1993, 43
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Mechanism of High Rate a-Si:H Deposition in a VHF Plasma
- Published online by Cambridge University Press: 01 January 1993, 49
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An Approach to High Quality a-Ge:H by VHF Deposition
- Published online by Cambridge University Press: 01 January 1993, 55
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Effects of Electrode Spacing and Hydrogen Dilution on a-SiC:H and a-Si:H Layers
- Published online by Cambridge University Press: 01 January 1993, 61
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Bandgap Engineering in Hydrogenated Silicon Films Made by Combined Hydrogen Dilution and Atomic Hydrogen Treatments
- Published online by Cambridge University Press: 01 January 1993, 67
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Optoelectronic Properties of a-Si:H Films Deposited From He-Diluted Silane
- Published online by Cambridge University Press: 01 January 1993, 73
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Fabrication of High Quality Poly-Si From Fluorinated Precursors
- Published online by Cambridge University Press: 01 January 1993, 79
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Reduction of the Defect Density in a-Si:H Deposited at ≤250°C
- Published online by Cambridge University Press: 01 January 1993, 91
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Electron Transport and Conduction-Band-Tail States in a-Si:H Deposited with a Remote Hydrogen Plasma
- Published online by Cambridge University Press: 01 January 1993, 97
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An Examination of H Effusion in a-Si:H Using Infrared Spectroscopy
- Published online by Cambridge University Press: 01 January 1993, 103
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Low-Temperature Chemical-Vapor Deposition of Amorphous Semiconductors and Insulators
- Published online by Cambridge University Press: 01 January 1993, 109
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Low Filament Temperature Deposition of a-Si:H by Catalytic Chemical Vapor Deposition
- Published online by Cambridge University Press: 01 January 1993, 121
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Separating the Contributions of Hydrogen and Structural Relaxation to Damage Annealing in a-Si:H
- Published online by Cambridge University Press: 01 January 1993, 127
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Hydrogen Content of a-Si:H and a-Si:H,F as a Function of Chemical Annealing
- Published online by Cambridge University Press: 01 January 1993, 133
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