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Effect of Gas Phase Hydrogen-Dilution on the Nucleation, Growth, and Interfaces Of a-Si1-xCx:H

Published online by Cambridge University Press:  01 January 1993

Yiwei Lu ,
Ilsin An ,
M. Gunes ,
M. Wakagi ,
C.R. Wronski  and
R.W. Collins
Yiwei Lu
Affiliation:
Materials Research Laboratory, The Pennsylvania State University, University Park, PA 16802.
Ilsin An
Affiliation:
Materials Research Laboratory, The Pennsylvania State University, University Park, PA 16802.
M. Gunes
Affiliation:
Also with the Department of Electrical and Computer Engineering.
M. Wakagi
Affiliation:
Also with the Department of Electrical and Computer Engineering. Hitachi Research Laboratory, Hitachi, Ltd., Hitachi-shi, 319-, Japan.
C.R. Wronski
Affiliation:
Also with the Department of Electrical and Computer Engineering.
R.W. Collins
Affiliation:
Materials Research Laboratory, The Pennsylvania State University, University Park, PA 16802.
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Abstract

The microstructural evolution of a-Si1-xCx:H with an optical gap of 1.95 eV, prepared by plasma-enhanced chemical vapor deposition (PECVD), has been studied versus gas phase H2- dilution by real time spectroscopic ellipsometry. As the H2/(CH4+SiH4) flow ratio is increased to 24, the monolayer-scale features of the growth process suggest an enhancement in precursor diffusion on substrate and film surfaces. Such features include a reduction in nucleation density, extensive surface smoothening during coalescence, and an increase the structural stability and density of the final film. We suggest a causal connection between these characteristics, and the photoelectronic properties of the film, which also improve with H2-dilution. Potentially detrimental effects of H2 dilution when a-Si1-xCx:H is deposited on TCO’s, including metal contamination at interfaces with Sn02 and H-diffusion into ZnO, are also characterized.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 297: Symposium A – Amorphous Silicon Technology - 1993 , 1993 , 31
Copyright
Copyright © Materials Research Society 1993

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References

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